SUSS MicroTec
MA100 / 150e Gen2
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
Wafer size
150mm
Optics
Mask Alignment, Exposure[1]
What it is
The SUSS MicroTec MA100 / 150e Gen2 is an automated mask aligner system for substrates up to 150 mm, combining mask alignment and exposure in a single piece of equipment.[1]
How it works
The MA100 / 150e Gen2 operates by bringing a mask into proximity or contact with a substrate, then exposing the arrangement to ultraviolet light to replicate the mask pattern.[1]
The system incorporates automated handling for consistent alignment and exposure, supporting wafer sizes up to 150 mm with capabilities for manual, semi-automated, or automated modes depending on configuration.[1]
Where it fits in the process flow
General reference — not yet source-verifiedIn the fabrication flow, the MA100 / 150e Gen2 is used for lithography steps that transfer the required circuit patterns onto wafers, typically after coating with a photosensitive resist and before developing or etching processes.
Applications
The mask aligner handles fragile and warped wafers common in MEMS and compound semiconductor processing, contributing to its utility across these sectors.[1]
- Mask Alignment
- Exposure
What do the numbers mean?
Wafer handling1
Optics & imaging1
Configuration & options1
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the MA100 / 150e Gen2 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA100 / 150e Gen2 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MA100 / 150e Gen2 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA100 / 150e Gen2 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA100 / 150e Gen2 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MA100 / 150e Gen2 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]hilpert.ch — hilpert.chhilpert.ch
Last updated Sep 22, 2026.
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