SUSS MicroTec
MA 200 Gen 3 Mask
The SUSS MA 200 Gen 3 is an automated mask aligner for wafer sizes up to 8" / 200 mm. The SUSS MA 200 Gen 3 is used for lithography applications in MEMS, advanced packaging, 3D packaging, compound semiconductors, power devices, photovoltaics, nanotechnology and wafer-level optics. The SUSS MA 200 Gen 3 is offered in 6-inch and 8-inch wafer configurations.[1]
What it is
General reference — not yet source-verifiedMask aligners are precision photolithography instruments used to transfer a pattern from a mask onto a photosensitive substrate. The system brings the mask into alignment with the wafer and exposes the photoresist to ultraviolet light.
How it works
General reference — not yet source-verifiedA mask aligner uses a light source and optical system to project the mask pattern onto the photosensitive wafer. Alignment is achieved through precision mechanical stages that position the mask and wafer relative to each other.
Where it fits in the process flow
General reference — not yet source-verifiedIn the photolithography workflow, the mask aligner is used after the wafer has been cleaned and coated with photoresist. The aligner performs the exposure step, after which the wafer proceeds to developing and subsequent pattern transfer processes.
Applications
General reference — not yet source-verifiedThe system can also be used in research and small-scale production of microelectronic and optoelectronic components.
What do the numbers mean?
Power & electrical6
- 50/60 Hz[2]
Wafer handling6
Optics & imaging2
Control & software4
Configuration & options9
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| MA 200 Gen 3 (6") | Gen 3 | — | 6-inch wafer size; electrical supply 3 Phase + N + PE, 25A, 5.5kVA, 50/60 Hz, 400V~ | Equipment inventory listing[2] |
| MA 200 Gen 3 (8" Compact) | Gen 3 | — | 8-inch wafer size; compact; electrical supply 3 Phase + N + PE, 50/60 Hz; with HDD and software | Equipment inventory listing[3] |
| MA 200 Gen 3 (8" Complete PC) | Gen 3 | — | 8-inch wafer size; complete PC with HDD; 3 Phase; includes BSA and DirectAlign options | Equipment inventory listing[5] |
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- OAI 200— Same function class: Lithography, nullCompare in depthsource[1]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the primary role of a mask aligner in photolithography?General reference — not yet source-verified
The mask aligner transfers a pattern from a photomask onto a photoresist-coated substrate by exposing it to light, thereby defining the features for subsequent processing steps.
What factors affect the resolution of mask aligners?General reference — not yet source-verified
Resolution depends on the exposure wavelength, the numerical aperture of the optical system, and the proximity gap between mask and substrate. Shorter wavelengths and smaller gaps generally yield finer features.
How does alignment accuracy impact the final device?General reference — not yet source-verified
Alignment accuracy determines how precisely the new pattern overlays existing structures. Poor alignment leads to misregistration and can cause device failure, so careful alignment is critical for multi-layer processes.
Not publicly documented
The following facts about the MA 200 Gen 3 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 200 Gen 3 Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the MA 200 Gen 3 Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 200 Gen 3 Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MA 200 Gen 3 Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the MA 200 Gen 3 Mask are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]web.archive.org — suss.com (Nov 12, 2024)web.archive.org
- [2]Inventory photo
- [3]Inventory photo
- [4]Inventory photo
- [5]inventory listing
Last updated Oct 2, 2026.
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