ASML
Twinscan NXT 1980 Di Immersion
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The ASML Twinscan NXT 1980 Di Immersion is a DUV immersion lithography scanner. The ASML Twinscan NXT 1980 Di Immersion uses a 193 nm ArF excimer laser light source. The ASML Twinscan NXT 1980 Di Immersion processes 300 mm wafers.[1][2]
How it works
The scanner employs a 193 nm ArF excimer laser light source. The projection lens is a catadioptric design with a numerical aperture of 1.35. The illuminator supports conventional and off-axis illumination modes including dipole and C-quad. The FlexRay prepared illuminator enables advanced pupil shaping for low-k1 imaging. The system includes a Parallel ILIAS sensor for on-the-fly lens heating correction and reticle heating correction. The SpotLess 2 system automatically cleans excessive focus spots from particles on the exposure chuck. The TWINSCAN NXT:1980Di achieves a resolution down to 38 nm in dipole mode and 40 nm in C-quad mode.[1][5][2]
What do the numbers mean?
Wafer handling2
Optics & imaging1
Configuration & options4
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
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Frequently asked questions
What light source does the Twinscan NXT 1980 Di use?
The Twinscan NXT 1980 Di uses an argon fluoride (ArF) excimer laser with a wavelength of 193 nm.[1][5][2]
What is the single-exposure resolution?
Single-exposure resolution is ≤38 nm in dipole illumination mode and 40 nm in C-quad mode.[1][5][2]
What is the throughput for 300 mm wafers?
Throughput is 275 wafers per hour.[5][2]
What is the overlay accuracy?
Overlay accuracy is ≤1.6 nm for single-machine (dedicated chuck) full-wafer coverage and ≤2.5 nm for matched-machine (to reference wafer) full-wafer coverage.[1]
What is the global system uptime?
The global system uptime is greater than 97%.[1]
Not publicly documented
The following facts about the Twinscan NXT 1980 Di Immersion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Twinscan NXT 1980 Di Immersion are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Twinscan NXT 1980 Di Immersion are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Twinscan NXT 1980 Di Immersion are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Twinscan NXT 1980 Di Immersion are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Twinscan NXT 1980 Di Immersion is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]asml.com — asml.comasml.com
- [2]instrumenthive.com — instrumenthive.cominstrumenthive.com
- [3]Inventory photo
- [4]waferpedia.comwaferpedia.com
- [5]ASML TWINSCAN NXT:1980Di Immersion Lithography Scanner (Refurbished) - InstrumentHive — instrumenthive.cominstrumenthive.com
Last updated Sep 27, 2026.
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