Waferpedia

Comparison ledger

Twinscan NXT 1980 Di Immersionversus1000 Family

ASML Twinscan NXT 1980 Di Immersion, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1000 FamilyUltratech
OEMASMLUltratech
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyASML Twinscan NXT 1980 Di ImmersionUltratech 1000 Family
Specifications
ManufacturerASML[1]—
ModelTwinscan NXT 1980 Di[1]—
CategoryLithography[2]—
Wafer size12 inch[1]—
Platform architectureNXT3 immersion technology[4]—
Overlay accuracy<1.5 nm (3σ)[4]—
Tool type—Photolithography step-and-repeat 1X stepper[5]
Optical design—Wynne Dyson[5]
Magnification—1X[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]asml.comasml.com
  4. [4]instrumenthive.cominstrumenthive.com
  5. [5]en.wikipedia.orgen.wikipedia.org