Applied Materials

Wafer size
Laser Wafer Mapping
Power
3 Phase, 208 V[1]
Vacuum
UES with Turbo Foreline[1]
Gas delivery
Gas Box:[1]
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
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The VIISta 80 uses a DPN (Aluminum) gas box with 5 sticks, with HP and SDS 2 in use, and a nitrogen MFC size of 1 slm.[1]
The VIISta 80 has two loadlock chambers of type UES with Turbo Foreline, a 200 mm cassette stage, and laser wafer mapping.[1]
The VIISta 80 requires 208 V three-phase power with a line frequency of 50/60 Hz.[1]
The VIISta 80 uses an Affinity RAA 012 K CE 55 CBC chiller.[1]
The following facts about the VIISta 80 High Current are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the VIISta 80 High Current are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the VIISta 80 High Current are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the VIISta 80 High Current are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the VIISta 80 High Current are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the VIISta 80 High Current is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Last updated Oct 1, 2026.
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