Comparison ledger
Applied Materials VIISta 80 High Current, Varian 160 XP Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | VIISta 80 High CurrentApplied Materials | 160 XP IonVarian |
|---|---|---|
| OEM | Applied Materials | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | Laser Wafer Mapping | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials VIISTA | Varian 160 XP Ion |
| Specifications | ||
| Line Voltage | 3 Phase, 208 V[1] | — |
| Line Frequency | 50 / 60 Hz[1] | — |
| UPS | EATON 9 PX 3000[1] | — |
| Configuration | Chamber A - DPN (Aluminum)[1] | 150mm High Current IMP[4] |
| He MFC Size | Optional[1] | — |
| N 2 MFC Size | 1 slm (for 500 sccm in the recipe)[1] | — |
| Type | UES with Turbo Foreline[1] | — |
| Cassette Stage | 200 mm (8") Standard[1] | — |
| Wafer size | Laser Wafer Mapping[1] | — |
| Lamp Colors | Red, Orange, Green[1] | — |
| Chiller | Affinity RAA 012 K CE 55 CBC[1] | — |
| DI Cart | VIISta 80 with B-Pure Filters[1] | — |
| Manufacturer | Applied Materials / Varian[2] | — |
| Model | VIISta 80[2] | 160 XP Ion[5] |
| Wafer Size | 200 mm (8 inch)[1] | — |
| Gas Box | 5 sticks, HP and SDS 2 in use; He MFC optional; N2 MFC 1 slm[1] | — |
| Loadlock / Cassette | 2 chambers, UES with Turbo Foreline; Cassette Stage 200 mm (8") Standard with Laser Wafer Mapping[1] | — |
| Vintage | 2000[1] | — |
| Laser Wafer Mapping | Yes[1] | — |
| Loadlock Chambers | 2, Type UES with Turbo Foreline[1] | — |
| Year of Manufacture | 2000[1] | — |
| SMIF Version | 200 mm SMIF[3] | — |
| Manufacturing Date | 2000-12-01[3] | — |
| OEM | — | Varian[5] |
| Category | — | Ion Implantation[4] |
| Tool type | — | ion implanter[4] |
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