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Ion Implantation

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147 entries

  1. VIISta HC Ion ImplantApplied Materials

    The Applied Materials / Varian VIISta HC Ion Implant is an ion implantation system.

    CategoryIon Implantation
  2. 350DVarian

    The Varian 350D is a medium current ion implanter that was the tool of choice for semiconductor doping in the early 1980s.

    CategoryIon Implantation
    Discontinued
  3. 6200 AAxcelis

    The Axcelis 6200 A is an ion implanter that accepts 6-inch wafers and supports automatic recipe loading.

    CategoryIon Implantation
  4. VIISta 810 XEriApplied Materials

    The Applied Materials / Varian VIISta 810 XEri is an ion implanter described as a 12-inch medium current system.

    CategoryIon Implantation
  5. E 500 HPApplied Materials

    The Applied Materials / Varian E 500 HP is an implanter described as a medium current ion implantation system for 8-inch wafers.

    CategoryIon Implantation
  6. 912-7014 Triode Lex Ion VacuumVarian
    CategoryIon Implantation
  7. VIISta 810Applied Materials

    Applied Materials / Varian VIISta 810 is a 12-inch medium current implanter.

    CategoryIon Implantation
  8. TP 500 Implant Dose MeasurementKLA

    The KLA / Therma-wave TP 500 is an implant dose measurement tool used in ion implantation.

    CategoryIon Implantation
  9. HEXP VIISta HEApplied Materials

    The Applied Materials HEXP VIISta HE is an ion implantation tool for 200mm wafers.

    CategoryIon Implantation
  10. EHPI 500Varian

    The Varian EHPi 500 is a medium current ion implanter offering an energy range of 5–260 keV (X+) and capable of handling wafer sizes up to 200 mm for features down to 0.18 µm.

    CategoryIon Implantation
  11. E 500 EHPI Medium CurrentApplied Materials

    The Applied Materials / Varian E 500 EHPI is a medium current implanter with a 6 inch wafer size.

    CategoryIon ImplantationWaferWafer Position Detect
  12. NV 8250 IonAxcelis
    CategoryIon Implantation
  13. E 220 HP IonVarian

    The Varian E 220 HP is an ion implanter that handles 6-inch and 8-inch wafers.

    CategoryIon Implantation
  14. VIISta HE XPApplied Materials

    The VIISta HE XP is a high-current ion implanter for semiconductor wafer processing.

    CategoryIon Implantation
  15. E 500 EHPI Ion ImplantVarian

    Varian E 500 EHPI Ion Implant System is a 6-inch wafer ion implant system with a Windows 7 control computer and V15.10.12 software.

    CategoryIon Implantation
  16. TP 420 Implant Dosing MeasurementKLA
    CategoryIon Implantation
  17. 350 D IonAgilent

    The Agilent 350 D Ion Implanter is a 150mm high current ion implanter.

    CategoryIon Implantation
  18. 0216 7696, E 11368072 ESCVarian

    The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.

    CategoryIon Implantation
  19. GSD HE High EnergyAxcelis

    The Axcelis GSD HE High Energy is an ion implanter for 200 mm wafers.

    CategoryIon Implantation
  20. Exceed 3000 AH Evo Ion ImplantNissin

    The Nissin Exceed 3000 AH Evo is an ion implant system manufactured by Nissin.

    CategoryIon Implantation
  21. E 500 Medium CurrentVarian

    The Varian E 500 Medium Current is an ion implanter for 8-inch wafers, introduced around 1996.

    CategoryIon Implantation
  22. NV 10 SD 160 IonAxcelis
    CategoryIon Implantation
  23. E 500 EHPVarian

    The Varian E 500 EHP is a medium current ion implanter that supports 6-inch wafers, includes a thin wafer handling kit, can be converted to 8-inch, and runs on 208V 3-phase 50/60 Hz power.

    CategoryIon Implantation
  24. NV 6200Axcelis
    CategoryIon Implantation
  25. Viision 200 IonVarian

    The Varian Viision 200 is an ion implanter for 8-inch wafers.

    CategoryIon Implantation
  26. VHCPApplied Materials

    The Applied Materials VHCP is an ion implantation tool.

    CategoryIon Implantation
  27. Viision 200 + High CurrentVarian

    The Varian Viision 200+ (also known as Viision 200 Plus and VIISion 200) is a high current ion implanter used for semiconductor wafer processing.

    CategoryIon Implantation
  28. GSD 200 EAxcelis

    The Axcelis GSD 200 E is an ion implanter.

    CategoryIon Implantation
  29. E 1000Varian

    The Varian E1000 is an ion implanter manufactured by Varian.

    CategoryIon Implantation
  30. Exceed 30Nissin
    CategoryIon Implantation
  31. NV 8200 PAxcelis

    The Axcelis NV 8200 P is an ion implantation tool.

    CategoryIon Implantation
  32. Optima MD IonAxcelis

    The Axcelis Optima MD is a medium current ion implanter for 300mm wafers, manufactured from 2006.

    CategoryIon Implantation
  33. NH 20 SP Medium Current IonNissin

    The Nissin NH 20 SP is a medium current ion implanter for 200 mm (8 inch) wafers.

    CategoryIon Implantation
  34. xR Leap IonApplied Materials

    The Applied Materials xR Leap Ion Implanter processes 8-inch Si wafers with an ultra-low energy range down to 300 eV.

    CategoryIon ImplantationWaferSi Wafer
  35. EPX 180 NEEdwards

    The Edwards EPX 180 NE is a dry vacuum pump designed for semiconductor applications such as ash/strip and implant end stations.

    CategoryIon Implantation
  36. NV 10 160 IonAxcelis

    The Axcelis NV 10 160 is an ion implanter that handles wafers from 3 to 6 inches and offers a maximum implant energy of 160 keV.

    CategoryIon ImplantationWaferMultiple wafer disks
  37. SEN NV GSD III 180 High Current IonSumitomo

    The Sumitomo / SEN NV GSD III 180 is a high current ion implanter stated to be for 6-inch wafers.

    CategoryIon Implantation
  38. Viision 80 Medium Current IonVarian

    Varian Viision 80 is a medium current ion implanter with an 8-inch wafer size.

    CategoryIon Implantation
  39. IMP HEAT Medium CurrentNissin
    CategoryIon Implantation
  40. GSD 100 High CurrentAxcelis

    The Axcelis GSD 100 High Current is a high current ion implanter that accepts 6-inch wafers.

    CategoryIon Implantation
  41. GSD 200 E High CurrentAxcelis
    CategoryIon Implantation
  42. PLADApplied Materials

    Applied Materials PLAD is an ion implantation tool in the plasma doping family.

    CategoryIon Implantation
  43. TP 500 Implant Dosing MeasurementKLA
    CategoryIon Implantation
  44. EHP 500Applied Materials

    The Applied Materials / Varian EHP 500 is an ion implanter for 6-inch wafers.

    CategoryIon Implantation
  45. NV GSD High EnergyAxcelis

    The Axcelis NV GSD High Energy is an ion implanter for 8-inch wafers.

    CategoryIon Implantation
  46. VAC 407 2 ABrooks

    The Brooks / PRI VAC 407 2 A is an ion implanter.

    CategoryIon Implantation
  47. EHPI E 220Varian

    The Varian EHPI E 220 is an ion implanter described as an 8-inch, medium-current system with a SMIF interface.

    CategoryIon Implantation
  48. NV GSD III LE High Current IonAxcelis

    The Axcelis NV GSD III LE is a high current ion implanter designed for 8-inch wafers, originally manufactured around 2003.

    CategoryIon Implantation
  49. NV GSD III 90 IonAxcelis

    The Axcelis NV GSD III 90 Ion is an ion implanter for 5-inch wafers, manufactured by Axcelis.

    CategoryIon Implantation
  50. PI 9500 XRApplied Materials

    The Applied Materials PI 9500 XR is an ion implanter.

    CategoryIon Implantation
  51. EHPI 500 Medium CurrentVarian

    The Varian EHPI 500 Medium Current is a medium-current ion implanter.

    CategoryIon Implantation
  52. NV GSD 200Axcelis

    The Axcelis NV GSD 200 is an ion implanter described with 208 V, 3 phase, 50/60 Hz power and 35 kVa input.

    CategoryIon Implantation
  53. GSD 200 E 2 High CurrentAxcelis

    The Axcelis GSD 200 E 2 is a high current implanter with source-stated wafer sizes of 6 inch and 8 inch.

    CategoryIon Implantation
  54. E 500 EHPIAgilent

    The Agilent / Varian E 500 EHPI is a medium current ion implanter for 8-inch wafers from 2003.

    CategoryIon Implantation
  55. 0010-14300 Magnet AssyApplied Materials
    CategoryIon Implantation
  56. Viision 200Varian

    The Varian Viision 200 (also spelled VIISion 200) is a batch-process, high-current ion implanter for 200 mm wafers, introduced in 1996.

    CategoryIon Implantation
  57. NV GSD HEAxcelis

    The Axcelis NV GSD HE is an ion implantation system that can handle 6-inch and 8-inch wafers.

    CategoryIon ImplantationWafer8"
  58. VIISta 900 XP IonApplied Materials

    The Applied Materials VIISta 900 XP Ion is an ion implanter.

    CategoryIon Implantation
  59. NV GSD A 80 IonAxcelis
    CategoryIon Implantation
  60. E 220Varian

    The Varian E 220 is an ion implanter described as a 3-phase, 5-wire, 208-volt system with E-clamp 6" capability and single-blade processing.

    CategoryIon Implantation