Varian
EHP 500 Ion
What it is
The Varian EHP 500 Ion is an ion implanter used for ion implantation in semiconductor manufacturing.[1][3]
How it works
General reference — not yet source-verifiedAn ion implanter accelerates ions and directs them into a wafer surface to modify material properties near the surface.
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation is a doping and modification step in the semiconductor process flow.
Applications
General reference — not yet source-verifiedIon implantation is used to introduce controlled dopants into semiconductor wafers and to adjust near-surface electrical properties.
What do the numbers mean?
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the EHP 500 Ion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EHP 500 Ion are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the EHP 500 Ion are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the EHP 500 Ion are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the EHP 500 Ion are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the EHP 500 Ion is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]EHP 500 Ion — Varian | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 6, 2026.
Compare with similar tools
View all →The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
The Varian 160 XP is an ion implanter. A variant, the Varian 160 XP Ion, is configured as a 150 mm high-current implanter.
The Varian 160 XP Ion is an ion implantation tool configured as a 150mm high-current implanter.