Tokyo Electron
Telius SCCM Jin Oxide
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Tokyo Electron Telius SCCM Jin Oxide is an oxide etcher. The Telius SCCM Jin Oxide processes 300 mm wafers.[1][2][3]
What it is
How it works
General reference — not yet source-verifiedAn etcher removes selected material from a wafer by exposing defined areas to a controlled plasma or reactive process so that patterned regions are transferred into the underlying film.
An oxide etcher is used to remove silicon dioxide or related oxide films while preserving masked regions, which makes selective dielectric pattern transfer possible.
Where it fits in the process flow
General reference — not yet source-verifiedThe Telius SCCM Jin Oxide sits in the wafer pattern-transfer portion of semiconductor fabrication after lithographic patterning and before later integration steps.
The Telius SCCM Jin Oxide is used when a patterned oxide film must be etched into a desired geometry for device fabrication.
Applications
What do the numbers mean?
Wafer handling1
Configuration & options2
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Telius SCCM Jin Oxide are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Telius SCCM Jin Oxide are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Telius SCCM Jin Oxide are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Telius SCCM Jin Oxide are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Telius SCCM Jin Oxide are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Telius SCCM Jin Oxide is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
- [2]fabsurplus.com — fabsurplus.comfabsurplus.com
- [3]TEL Tokyo Electron Telius SCCM Jin Etch Oxide for sale — fabsurplus.comfabsurplus.com
- [4]waferpedia.comwaferpedia.com
Last updated Oct 2, 2026.
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