Tokyo Electron
Tactras Vesta Poly Silicon
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Tokyo Electron Tactras Vesta Poly Silicon is an etch tool designed for poly silicon processing.[1][2]
What it is
General reference — not yet source-verifiedThe machine belongs to the class of dry etch tools used in the front-end-of-line portion of a semiconductor fabrication process.
How it works
General reference — not yet source-verifiedPlasma etch systems generate a reactive plasma from process gases introduced into a low-pressure chamber.
The plasma contains ions and radicals that chemically react with the polysilicon surface while ions are accelerated toward the wafer to provide directional etching.
Where it fits in the process flow
General reference — not yet source-verifiedThe system is typically positioned after a polysilicon deposition step, such as low-pressure chemical vapor deposition (LPCVD), and before photoresist stripping and post-etch cleaning.
Applications
General reference — not yet source-verifiedThe primary application is the anisotropic etching of polysilicon for gate definition in CMOS logic, memory, and other semiconductor devices.
The system may also be used for etching polysilicon in microelectromechanical systems (MEMS) or other devices that require precise patterning of polycrystalline silicon films.
What do the numbers mean?
No specifications recorded yet
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Where are the manuals?
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Not publicly documented
Field notes
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Not publicly documented
The following facts about the Tactras Vesta Poly Silicon are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No specifications for the Tactras Vesta Poly Silicon are on record.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Tactras Vesta Poly Silicon are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Tactras Vesta Poly Silicon are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Tactras Vesta Poly Silicon are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Tactras Vesta Poly Silicon are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
- [2]Tactras Vesta Poly Silicon — Tokyo Electron | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 2, 2026.
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