Waferpedia

Tokyo Electron

Alpha 8 SE D

Alpha 8 SE D — Inventory photo
Fig. 01Alpha 8 SE DInventory photo[1]

Gas delivery

Waves[1]

Optics

Fenwal / MDMR-5FR[1]

What it is

General reference — not yet source-verified

The machine belongs to the class of thermal processing equipment used in front-end semiconductor fabrication. Such systems perform controlled heating of silicon wafers to achieve specific material modifications, such as dopant diffusion, oxidation, or annealing. Diffusion furnaces like this one are typically horizontal or vertical tube furnaces that hold multiple wafers in a quartz boat and expose them to precisely regulated temperatures and process gases.

How it works

General reference — not yet source-verified

Machines of this class operate by heating wafers in a quartz or silicon carbide tube to temperatures typically ranging from several hundred to over one thousand degrees Celsius. Process gases (e.g., oxygen, nitrogen, or dopant sources) are introduced into the tube under controlled flow and pressure. The wafers are loaded via an automated handling system, and a programmable temperature profile ramps the furnace to the target temperature, holds it for a specified duration, and then cools down. The entire process is managed by a control system that ensures uniform temperature distribution across the wafer batch to achieve consistent material properties.

What do the numbers mean?

Wafer handling2

Cassette I/O Type
Normal I/O Type[1]
Accurate?
Wafer size
6 inch[1]
Accurate?

Gas & chemistry6

Gas Controller
Waves[1]
Accurate?
Gas Flow Chart Panel
Installed (Front, Rear)[1]
Accurate?
Gas Detector
GD-K 7 D 4[1]
Accurate?
Detecting Gas
Hcl, N2O[1]
Accurate?
Process Gas
N2, O2, H2, N2O[1]
Accurate?
Basic Style
Integrated Gas System (Fujikin)[1]
Accurate?

Optics & imaging1

Furnace Overtemp Detector
Fenwal / MDMR-5FR[1]
Accurate?

Control & software5

System Main Controller
Waves[1]
Accurate?
Mechanical Controller
Waves[1]
Accurate?
Sequence Controller
Waves[1]
Accurate?
Furnace Temperature Controller
560 A[1]
Accurate?
User Host Computer I/F
SECS[1]
Accurate?

Configuration & options13

High Temp Oxide[1]
Accurate?
System Type
L Type[1]
Accurate?
Heater Model
VMU-40-007EX (1200 Deg C)[1]
Accurate?
AGV Compatibility
Unable[1]
Accurate?
Optional Panel
Installed (Front, Rear)[1]
Accurate?
Signal Tower / Colors
Installed, 3 colors[1]
Accurate?
Host Communications[1]
Accurate?
Process
Hi Temp Oxide[2]
Accurate?
OEM
Tel[1]
Accurate?
Model
Alpha 8 SE D[1]
Accurate?
Equipment type
Furnace[1]
Accurate?
Process
Hi Temp Oxide / High Temp Oxide[2]
Accurate?
Vintage
2006[1]
Accurate?
Interested in this tool?
Need help with this tool?Embed spec card

What replaced it?

Alternatives

Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Gas ControllerWaves[1]
  • Gas Flow Chart PanelInstalled (Front, Rear)[1]
  • Gas DetectorGD-K 7 D 4[1]
  • Detecting GasHcl, N2O[1]
  • Process GasN2, O2, H2, N2O[1]
  • Basic StyleIntegrated Gas System (Fujikin)[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Worked with this tool? Help preserve its knowledge →

Frequently asked questions

What kinds of processes can be run on this class of system?General reference — not yet source-verified

Machines of this class can perform thermal oxidation, diffusion, annealing, and low-pressure chemical vapor deposition, depending on the gas supply and system configuration.

What process parameters are most important for this equipment class?General reference — not yet source-verified

Temperature uniformity, temperature ramp rates, process pressure, gas flow composition, and gas flow sequencing are the key parameters that determine process results.

Why are vertical thermal systems common in semiconductor manufacturing?General reference — not yet source-verified

The vertical orientation helps reduce gravity-driven particle contamination on wafer surfaces and allows for uniform temperature control around the wafer load.

What maintenance considerations apply to vertical thermal furnaces?General reference — not yet source-verified

The heated process tube, wafer boat, and related quartzware require regular cleaning and occasional replacement, and systems are periodically conditioned to maintain stable and repeatable process conditions.

Not publicly documented

The following facts about the Alpha 8 SE D are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Alpha 8 SE D are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Alpha 8 SE D are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Alpha 8 SE D are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Alpha 8 SE D are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Alpha 8 SE D is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]inventory listing
Was this page accurate?

Last updated Oct 11, 2026.

Compare with similar tools

View all →