Waferpedia

Temescal

VCT-1800

The Temescal VCT-1800 is a thin film deposition system. The Temescal VCT-1800 can be configured with a fast cycle load lock, sputtering sources, a multi-pocket electron beam gun, and an ion source. The Temescal VCT-1800 has a water-cooled, RF-bias rotating substrate holder with a usable area of seven inches in diameter.[1]

VCT-1800 — tescal.com
Fig. 01VCT-1800tescal.com[1]

What it is

The Temescal VCT-1800 is a thin-film deposition system.[1]

The VCT-1800 is a configured system that can include a fast cycle load lock, sputtering sources, a multi pocket electron beam gun, and an ion source for etching and ion assisted deposition.[1]

How it works

The VCT-1800 uses a water cooled, RF bias, rotating substrate holder with a usable area of seven inches in diameter.[1]

The VCT-1800 can combine sputtering, electron beam evaporation, ion-assisted deposition, and etching within one platform.[1]

Where it fits in the process flow

The VCT-1800 is primarily designed for research and development applications.[1]

Applications

The VCT-1800 supports sputter deposition, electron beam deposition, ion-assisted deposition, and etching.[1]

  • etching
  • ion assisted deposition
  • R&D applications

What do the numbers mean?

Power & electrical1

Substrate holder
water cooled, RF bias, rotating substrate holder[1]
Accurate?

Wafer handling1

fast cycle load lock, an array of sputtering sources, multi-pocket electron beam gun, and an ion source for etching and ion assisted deposition[1]
Accurate?

Configuration & options3

System type
thin film deposition system[1]
Accurate?
Usable area
seven inches in diameter[1]
Accurate?
Intended use
primarily designed for R&D applications[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Substrate holderwater cooled, RF bias, rotating substrate holder[1]

Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What deposition methods can the VCT-1800 be configured to use?

The VCT-1800 can be configured with sputtering sources, a multi pocket electron beam gun, and an ion source for etching and ion assisted deposition.[1]

What type of substrate handling does the VCT-1800 use?

The VCT-1800 uses a water cooled, RF bias, rotating substrate holder.[1]

What is the usable substrate area on the VCT-1800?

The VCT-1800 has a usable area of seven inches in diameter.[1]

What is the main intended use of the VCT-1800?

The VCT-1800 is primarily designed for research and development applications.[1]

Not publicly documented

The following facts about the VCT-1800 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the VCT-1800 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the VCT-1800 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the VCT-1800 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the VCT-1800 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the VCT-1800 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]tescal.com — tescal.comtescal.com
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Last updated Oct 3, 2026.

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