Oxford Instruments
800 Plus
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
The Oxford 800 Plus is explicitly designated as a plasma-enhanced chemical vapor deposition system. The system is rated for 50/60 Hz mains power.[1]
How it works
The 800 Plus employs pulsed high-frequency (HF) and low-frequency (LF) power mixing to control film stress. The ratio of HF to total power, expressed as percentage HF, determines whether the deposited film is compressive or tensile. The stress can be adjusted continuously from compressive to tensile by varying the HF pulse time.[2]
What do the numbers mean?
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| 80 Plus | — | — | Shorter cleaning interval due to frequent chamber venting; lower power deposition (<50 W) | nanolab.berkeley.edu[2] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.
- PECVD Overview from Oxford InstrumentsDocumentberkeley.edu
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
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Frequently asked questions
Not publicly documented
The following facts about the 800 Plus are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 800 Plus are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the 800 Plus are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 800 Plus are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 800 Plus is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 800 Plus are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]nanolab.berkeley.edu — nanolab.berkeley.edunanolab.berkeley.edu
- [3]University-of-Utah-94-721002-System-Manual — nanofab.utah.edunanofab.utah.edu
- [4]PECVD System Manual - Maryland University 94-219896 .pdf — nanocenter.umd.edunanocenter.umd.edu
Last updated Sep 25, 2026.
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