Nanospec
AFT-6100
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
General reference — not yet source-verifiedThe Nanospec AFT-6100 is a thin-film measurement system used for optical metrology in semiconductor and microelectronics fabrication.
The Nanospec AFT-6100 is a reflectometer, a class of instruments that determine film thickness and optical properties by measuring reflected light intensity across a range of wavelengths.
How it works
General reference — not yet source-verifiedThe Nanospec AFT-6100 directs a broad-spectrum light beam onto the sample surface and measures the intensity of the reflected light as a function of wavelength.
The measured reflectance spectrum is compared to theoretical models generated from the optical constants of the film and substrate materials.
Where it fits in the process flow
General reference — not yet source-verifiedThe Nanospec AFT-6100 is used in process control and quality assurance after thin-film deposition steps such as chemical vapor deposition, physical vapor deposition, or spin-coating.
The Nanospec AFT-6100 can be used to monitor film thickness uniformity across a wafer, providing feedback to deposition equipment for process optimization.
Applications
General reference — not yet source-verifiedThe Nanospec AFT-6100 is used to measure transparent and semi-transparent thin films including silicon dioxide, silicon nitride, polysilicon, and photoresists.
The Nanospec AFT-6100 can characterize single-layer and multilayer stacks used in advanced semiconductor devices, flat-panel displays, and microelectromechanical systems.
What do the numbers mean?
Optics & imaging2
- Facility listing
- Listed in the EPFL Center of MicroNanoTechnology (CMi) equipment portfolio under optical measurement[1]
What replaced it?
Related models
- siblingBruker Contour X— Listed in the same optical measurement section of the EPFL CMi equipment portfolio as the Nanospec AFT-6100.source[1]
- siblingFilmetrics F20-UV— Listed in the same optical measurement section of the EPFL CMi equipment portfolio as the Nanospec AFT-6100.source[2]
- siblingFilmetrics F54— Listed in the same optical measurement section of the EPFL CMi equipment portfolio as the Nanospec AFT-6100.source[1]
- siblingToho Technology FLX-2320-S— Listed in the same optical measurement section of the EPFL CMi equipment portfolio as the Nanospec AFT-6100.source[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the typical measurement speed for automated tools in this class?General reference — not yet source-verified
Automated tools of this type can measure multiple sites on a wafer or substrate in seconds per site, depending on the number of spectral points and the complexity of the film stack. The exact speed varies by model and configuration, but the class is optimized for high-throughput measurements in production environments.
Can this class handle patterned wafers or rough surfaces?General reference — not yet source-verified
Yes, many modern tools in this class are designed to work on patterned wafers by using small measurement spots and advanced algorithms to separate the film signal from substrate effects. However, heavy roughness or large topography may degrade accuracy. The capability depends on the specific optical design and software, but the class generally accommodates typical semiconductor patterns.
How is the system calibrated?General reference — not yet source-verified
Calibration is typically performed using a reference standard with a known film thickness (e.g., a certified silicon dioxide film on silicon). The system’s light source and detector are normalized against this standard to ensure accurate reflectance measurements. Some tools also offer auto-calibration routines using built-in reference optics.
Not publicly documented
The following facts about the AFT-6100 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the AFT-6100 are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the AFT-6100 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the AFT-6100 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the AFT-6100 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the AFT-6100 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No research found yet — worked with this tool? Share what you know.
Sources & citations
Last updated Oct 10, 2026.
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