Waferpedia

Mattson

Paradigme

EtchMattson Paradigme family
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The Mattson Paradigme is an etch system used in semiconductor manufacturing. The Mattson Paradigme is a dry etcher designed for advanced pattern-etch applications in integrated circuit fabrication. The Mattson Paradigme was designed for use at the 20-nanometer technology node and below.[1][2]

MattsonParadigme
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What it is

The Mattson Paradigme is an etch system used in semiconductor manufacturing.[3][5][1][2]

The Paradigme is a dry etcher designed for advanced pattern-etch applications in integrated circuit fabrication.[2]

How it works

The paradigmE uses a proprietary plasma source that enables advanced etch performance in a two-wafer chamber design.[2]

The two-wafer chamber design processes two wafers simultaneously, combining high throughput with etch results comparable to single-wafer vacuum chambers.[2]

Mattson Technology's paradigmE etch system supports multi-pattern etch techniques including dual pattern transfer (DPT), quadruple pattern transfer (QPT), and spacer-defined double patterning (SDDP).[2]

Where it fits in the process flow

The paradigmE was designed for use at the 20-nanometer technology node and below, where multi-pattern etching enables the production of features smaller than the limits of immersion lithography.[2]

Applications

The paradigmE etch system is used for advanced etch applications, including advanced pattern multiplying etches for the production and development of leading-edge integrated circuits.[2]

The system supports applications for 3D transistor and 3D memory array devices.[2]

Multi-pattern etch techniques performed on the paradigmE—such as dual pattern transfer, quadruple pattern transfer, and spacer-defined double patterning—provide alternatives for producing features smaller than the current limits of immersion lithography.[2]

What do the numbers mean?

Wafer handling2

Wafer size
300 mm[4]
Accurate?
Chamber design
two-wafer chamber design[2]
Accurate?

Configuration & options5

Manufacturer
Mattson[3]
Accurate?
Model
Paradigme[3]
Accurate?
Category
Etch[1]
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Process node
20-nanometer technology node and below[2]
Accurate?
Plasma source
proprietary plasma source[2]
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Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
Paradigme XP Light—2010Light Etch versionwaferpedia.com[4]
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Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What wafer size does the Mattson Paradigme support?

The Paradigme XP Light variant supports 300 mm wafers.[4]

What types of etch applications is the Paradigme designed for?

The Paradigme is designed for advanced etch applications, including advanced pattern multiplying etches for the production and development of leading-edge integrated circuits.[1][2]

What multi-pattern etch techniques does the Paradigme support?

The Paradigme supports dual pattern transfer, quadruple pattern transfer, and spacer-defined double patterning.[1][2]

For which technology node was the Paradigme designed?

The Paradigme was designed for use at the 20-nanometer technology node and below.[1][2]

What is the chamber configuration of the Paradigme?

The Paradigme uses a two-wafer chamber design.[1][2]

Not publicly documented

The following facts about the Paradigme are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Paradigme are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the Paradigme are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Paradigme are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Paradigme is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the Paradigme are on record.

    Answerable by: an OEM parts catalog or a service engineer

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Sources & citations

Sources (5)Every fact above is drawn from these public sources
  1. [1]waferpedia.com — waferpedia.comwaferpedia.com
  2. [2]semiconductoronline.com — semiconductoronline.comsemiconductoronline.com
  3. [3]Equipment inventory listing
  4. [4]waferpedia.com — waferpedia.comwaferpedia.com
  5. [5]Equipment inventory listing
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Last updated Oct 3, 2026.

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