Lam Research
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The Lam Research TCP 9400 ICP is an inductively coupled plasma (ICP) etcher. The TCP 9400 ICP is an etch tool used in semiconductor manufacturing. The TCP 9400 ICP is categorized by Lam Research under the Etch product category.[1][2]
The Lam Research TCP 9400 ICP is a semiconductor etch tool.[1][2]
The TCP 9400 ICP uses inductively coupled plasma etching.[1]
An inductively coupled plasma etcher generates plasma in a process chamber and uses that plasma to remove material from a wafer surface.
An etch tool in this class is used to transfer patterns into films by selectively removing exposed material after lithographic patterning.
The TCP 9400 ICP sits in the pattern-transfer portion of semiconductor manufacturing, after lithography has defined where material is to be removed.
The TCP 9400 ICP is used before later steps that rely on the etched pattern being present in the wafer surface or film stack.
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The following facts about the TCP 9400 ICP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the TCP 9400 ICP are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the TCP 9400 ICP are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the TCP 9400 ICP are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the TCP 9400 ICP are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the TCP 9400 ICP is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Sep 29, 2026.
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