Denton Vacuum
635LL
The Denton 635LL is a multi-cathode sputter deposition system that coats substrates up to 200 mm in diameter. The Denton 635LL features four cathodes, residual gas analysis (RGA), and optical emission spectroscopy (OES) feedback for reactive sputtering with oxygen or nitrogen. The Denton 635LL includes a heated/cooled chuck rated to 500 °C and supports co-sputtering.[1][2][3]
Wafer size
200mm
Gas delivery
Included[1]
What it is
The Denton Vacuum 635LL is a thin film deposition tool used for sputtering in a cleanroom environment.[1][2][3]
How it works
Where it fits in the process flow
Applications
The Denton Vacuum 635LL is used for sputtering metals, alloys, oxides, and ceramics.[1][2][3]
The Denton Vacuum 635LL is used for reactive sputtering with oxygen or nitrogen and for co-sputtering of deposited films.[1][2][3]
- Thin film deposition
- Sputtering
What do the numbers mean?
Wafer handling4
Gas & chemistry2
Configuration & options5
What replaced it?
Related models
- siblingDenton Vacuum Discovery 18— Listed alongside the 635LL in the sputtering section as another Denton sputtering tool.source[3]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the 635LL are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 635LL are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 635LL are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 635LL are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 635LL are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 635LL is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]nanofab.utah.edu — nanofab.utah.edunanofab.utah.edu
- [2]https://www.nanofab.utah.edu/wp-content/uploads/2020/04/NF-tool-list-April-2020.pdf — nanofab.utah.edunanofab.utah.edu
- [3]nanofab.utah.edu — nanofab.utah.edunanofab.utah.edu
Last updated Oct 3, 2026.
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