ASML
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The PAS 2000 is a wafer stepper that was ASML's first lithography product. The PAS 2000 used oil pressure to move the wafer, which caused leakage. The PAS 2000 achieved a critical dimension between 1.0 and 1.3 micron and an overlay accuracy of 0.25 micron.[1][2][3]
Documented failure modes, common issues, and field considerations.
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The ASML PAS 2000 was ASML's first product, a wafer stepper used in semiconductor photolithography.[1][2]
The PAS 2000 was introduced in 1984.[3]
The following facts about the PAS 2000 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the PAS 2000 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the PAS 2000 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the PAS 2000 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the PAS 2000 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the PAS 2000 are on record.
Answerable by: university cleanroom staff or an OEM application specialist
Last updated Oct 10, 2026.
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