Waferpedia

Applied Materials

Endura 5500

DepositionProduced 1990–Applied Materials Endura 5500 family
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The Applied Materials Endura 5500 is a multi-chamber, multi-process physical vapor deposition (PVD) system introduced in 1990. The Endura 5500 is used for metallization in semiconductor fabrication, handling 200 mm wafers. The Endura 5500 platform became the most successful metallization system in the semiconductor industry, with over 4,500 systems shipped.[1][2][3][4][5][6]

Endura 5500 — Inventory photo
Fig. 01Endura 5500Inventory photo[7]

Produced

1990–

Power

50 Hz[2]

Vacuum

Dry Pump[2]

What it is

The Applied Materials Endura 5500 is a physical vapor deposition system used in semiconductor manufacturing.[2]

How it works

The Endura 5500 family uses a chambered platform with transfer and process chambers, together with a robot for wafer handling.[2][3][5]

Where it fits in the process flow

The Endura 5500 sits in the metallization part of the fabrication flow.[4][5][6]

Applications

The Endura 5500 is used for depositing metal and barrier films in semiconductor devices.[2][4][5][6]

  • Liner/Barrier
  • Front-End Metallization
  • Aluminum Interconnect

What do the numbers mean?

Power & electrical13

Line Frequency
50 Hz[2]
Accurate?
ChC/ChD
RF PCII[15]
Accurate?
ChC
RF PCII[19]
Accurate?
Voltage
430 VAC[23]
Accurate?
Voltage
480 VAC[24]
Accurate?
Phase
3 Phase[25]
Accurate?
Frequency
60 Hz[26]
Accurate?
Line Frequency
50 Hz (some units) / 60 Hz (others)[2]
Accurate?
Electrical Configuration
3 Phase, 3 Wire + Ground, 480 Vac[5]
Accurate?
Primary Side Trip Amperage
3 P 3 L 208 VAC[2]
Accurate?
GFI Trip Amperage
50 ~ 100 mA[2]
Accurate?
Electrical
3 Phase - 3 Wire + Ground - 60 Hz - 480 Vac[5]
Accurate?
Electrical
3 Phase - 3 Wire + Ground - 60 Hz[6]
Accurate?

Vacuum & pumping1

Dry Pump[2]
Accurate?

Wafer handling11

Wafer Shape
SNNF[2]
Accurate?
Transfer Chamber:[2]
Accurate?
Robot
HP with Fabworx Blade, Wrist, and Arms[14]
Accurate?
Robot
HP[21]
Accurate?
Robot
HP/VHP with Fabworx Blade, Wrist, and Arms[22]
Accurate?
Wafer Size
8 inch (200 mm)[2]
Accurate?
Robot
VHP Robot[5]
Accurate?
Transfer Chamber Positions (example)
Position 1: Durasource TTN, Position 2: Durasource AL, Position 3: Durasource TTN, Position 4: Durasource AL[2]
Accurate?
Wafer Sizes
8 inch[2]
Accurate?
Chamber Configuration (Transfer Chamber)
Position 1: Dura TTN, Position 2: Aluminum, Position 3: Dura TTN, Position 4: Aluminum[2]
Accurate?
Robot Type
VHP[6]
Accurate?

Optics & imaging1

System Safety Features
EMO (Turn to Release), GFI on Primary with EMO Shunt Trip, GFI on Secondary, Circuit Breaker 400 A, GFI Trip 50-100 mA, Water Leak Detector, Smoke Detector[2]
Accurate?

Control & software2

System Controller[2]
Accurate?
Software
v8.89[14]
Accurate?

Configuration & options64

Main AC Power Intel Hole[2]
Accurate?
Main AC ZCT Box[2]
Accurate?
Compressor (3)[2]
Accurate?
Gen Rack[2]
Accurate?
Heat Exchanger[2]
Accurate?
Position 1
Dura TTN[2]
Accurate?
Position 1 Process
Durasource TTN[2]
Accurate?
Position 2
Aluminum[2]
Accurate?
Position 2 Process
Durasource AL[2]
Accurate?
Position 3
Dura TTN[2]
Accurate?
Position 3 Process
Durasource TTN[2]
Accurate?
Position 4
Aluminum[2]
Accurate?
Position 4 Process
Durasource AL[2]
Accurate?
Buffer Chamber:[2]
Accurate?
Position A
Pass Thru[2]
Accurate?
Liner/Barrier[3]
Accurate?
Front-End Metallization[4]
Accurate?
Aluminum Interconnect[6]
Accurate?
AL SPT[7]
Accurate?
AlCu[16]
Accurate?
SLAB[17]
Accurate?
No Chambers[18]
Accurate?
Ch1/ch3
AICu[14]
Accurate?
Pedestal
A101[14]
Accurate?
ChE/ChF
Orient Degas[14]
Accurate?
Ch1
Ti[15]
Accurate?
Pedestal
A4 Clamped[15]
Accurate?
Ch3
AICu[15]
Accurate?
Ch2/Ch4
TiN[15]
Accurate?
Pedestal
Quartz[15]
Accurate?
Ch2/Ch3
AICuW[19]
Accurate?
Pedestal
HTHU Clamped[19]
Accurate?
Ch4
TiN[19]
Accurate?
ChE
Orient Degas[19]
Accurate?
Ch2
AICuW[20]
Accurate?
Pedestal
HT ESC[20]
Accurate?
Ch1
AISiCu[21]
Accurate?
Ch3
No Process[21]
Accurate?
Pedestal
A101 Cool[21]
Accurate?
Ch4
AISi[21]
Accurate?
4 PVD Chambers
2TiN/1Ti/1Al[27]
Accurate?
4 PVD Chambers
1TiN / 1 IMP Ti / 1 Ti / 1Al[28]
Accurate?
2 CVD / 3 PVD Chambers
2TxZ/1Ti/1IMP Ti/1Co[3]
Accurate?
5 PVD Chambers
2TiN/1Ti/1Al/1NiPt[5]
Accurate?
Chamber Configuration (example 1)
5 PVD Chambers: 2 TiN, 1 Ti, 1 Al, 1 NiPt[5]
Accurate?
Chamber Configuration (example 2)
2 CVD / 3 PVD Chambers: 2 TxZ, 1 Ti, 1 IMP Ti, 1 Co[3]
Accurate?
Buffer Chamber Positions (example)
Position A: Pass Thru, Position B: Cooldown, Position C: Durasource TI, Position F: Orienter (Standard Degas)[2]
Accurate?
Position B
Cooldown[2]
Accurate?
Position C
Titanium[2]
Accurate?
Position C Process
Durasource TI[2]
Accurate?
Position F
Orienter[2]
Accurate?
Position F orient Type
Standard Degas with Temp feedback (Gimball Type)[2]
Accurate?
System EMO Type
Turn to Release[2]
Accurate?
Circuit Breaker on Secondary
400 A[2]
Accurate?
Vintage
2000[5]
Accurate?
Buffer Chamber Positions
Pass Thru, Cooldown, Titanium, Orienter (Standard Degas with Temp feedback)[2]
Accurate?
Vintage
2014[3]
Accurate?
Chamber Configuration
2 CVD / 3 PVD Chambers: 2TxZ/1Ti/1IMP Ti/1Co[3]
Accurate?
Application
Liner/Barrier[3]
Accurate?
Application
Front-End Metallization[5]
Accurate?
PVD Chamber Count
5[6]
Accurate?
PVD Chamber Types
2TiN/1Ti/1Al/1NiPt[6]
Accurate?
Vintage
1996[6]
Accurate?
Application
Aluminum Interconnect[6]
Accurate?

Vintage & configurations

  1. 1990-07-12Production start[1]

    Introduction date of the Endura 5500 PVD system

Documented models & variants

DesignationGenerationVintageChangesSource
Liner/Barrier——Described as an 8-inch Endura 5500 PVD configuration for liner/barrier use.Equipment inventory listing[3]
Front-End Metallization——Described as an 8-inch Endura 5500 PVD configuration for front-end metallization.Equipment inventory listing[4]
Aluminum Interconnect——Described as an 8-inch Endura 5500 PVD configuration for aluminum interconnect.Equipment inventory listing[6]
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What replaced it?

Alternatives

Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Line Frequency50 Hz[2]
  • ConfigurationDry Pump[2]
  • ChC/ChDRF PCII[15]
  • ChCRF PCII[19]
  • Voltage430 VAC[23]
  • Voltage480 VAC[24]
  • Phase3 Phase[25]
  • Frequency60 Hz[26]
  • Line Frequency50 Hz (some units) / 60 Hz (others)[2]
  • Electrical Configuration3 Phase, 3 Wire + Ground, 480 Vac[5]
  • Primary Side Trip Amperage3 P 3 L 208 VAC[2]
  • GFI Trip Amperage50 ~ 100 mA[2]
  • Electrical3 Phase - 3 Wire + Ground - 60 Hz - 480 Vac[5]
  • Electrical3 Phase - 3 Wire + Ground - 60 Hz[6]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What wafer size does the Endura 5500 support?

The Endura 5500 supports 200 mm (8 inch) wafers.[2][3][4][5][6]

Not publicly documented

The following facts about the Endura 5500 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • The control-system platform and OS era of the Endura 5500 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Endura 5500 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Endura 5500 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the Endura 5500 are on record.

    Answerable by: an OEM parts catalog or a service engineer

  • No publicly hosted manuals, SOPs, or datasheets for the Endura 5500 are on record.

    Answerable by: university cleanroom staff or an OEM application specialist

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Sources & citations

Sources (29)Every fact above is drawn from these public sources
  1. [1]chiphistory.org — chiphistory.orgchiphistory.org
  2. [2]inventory listing
  3. [3]Inventory photo
  4. [4]inventory listing
  5. [5]Inventory photo
  6. [6]inventory listing
  7. [7]Inventory photo
  8. [8]Inventory photo
  9. [9]Inventory photo
  10. [10]Inventory photo
  11. [11]Inventory photo
  12. [12]Inventory photo
  13. [13]Inventory photo
  14. [14]Inventory photo
  15. [15]Inventory photo
  16. [16]inventory listing
  17. [17]inventory listing
  18. [18]inventory listing
  19. [19]inventory listing
  20. [20]inventory listing
  21. [21]inventory listing
  22. [22]inventory listing
  23. [23]inventory listing
  24. [24]inventory listing
  25. [25]inventory listing
  26. [26]inventory listing
  27. [27]inventory listing
  28. [28]inventory listing
  29. [29]cnf.cornell.educnf.cornell.edu
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Last updated Oct 10, 2026.

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