CHA

The CHA SSC-1000 is a multi-station sputtering system configured with up to four RF or DC cathodes.

CHA Industries’ 635 Series modular deposition systems support both sputtering and evaporation for semiconductor and compound semiconductor wafer coating.

The CHA Solution E-Beam Evaporator is an E-beam evaporator with a listed Glassman power supply.

The CHA SE 600 RAP E-Beam is an e-beam evaporator used for thin film deposition.

The CHA 600 is a high vacuum deposition system offered by CHA Industries.

CHA SEC 1000 RAP Vacuum is a vacuum evaporation system in the deposition category.

The CHA Mark 40 is an e-beam evaporator used for physical vapor deposition (PVD).

CHA SEC-1000 is a sputtering system described as a 10-inch system.

The CHA SSC-600 is a sputtering system described as a 6-inch system that supports sputter up or sputter down operation.

The CHA SEC 600 E-Beam is an electron beam evaporation system used for thin film deposition.

CHA Industries lists the Mark 50 Resolution as one of its product systems. CHA Industries describes its product systems as high-performance vacuum deposition systems.

The CHA Mark 50 C RH Vacuum Evaporator is a vacuum evaporation system with a 3-phase 208 VAC power supply and dual CTI 9600 cryo compressors.

CHA SE-1000 is a sputtering system described as a 10-inch system.

The CHA Mark 50 LH is a vacuum evaporator that supports 6-inch wafers.

The CHA SE 600 High Vacuum E-Beam Evaporation System is a deposition tool configured for 3 in. diameter wafers.

The CHA Mark 60 is a custom vacuum deposition system offered by CHA Industries.

The CHA Mark 50 Vacuum Evaporator is a vacuum evaporator with 3 phase, 208 VAC, 60 Hz, and 175 amps specified.

The CHA PPC 3000 Heatless Dryer is a dryer identified by make CHA and model PPC 3000.

CHA SEC-1000/SE-1000 is a vacuum deposition system for precision coating.

The CHA 50 S is an e-beam evaporator deposition system that includes a 5-pocket configuration, a Temescal CV 8 scan/beam controller, a Maxtech MDC 360 deposition monitor, and CTI 8-inch cryopumps with helium recharge units.

The CHA Mark 40 C RH PC PLC Vacuum is a vacuum evaporator used for deposition.

General referenceThe CHA 021 is a model of a high-vacuum electron beam evaporation system, a class of equipment used for thin film deposition in research and small-scale production.

CHA LN2 is a cold-weld pinch-off accessory described as an LN2 trap purge/siphon tool with heater.

The CHA Criterion Solution SEC-600/SE-600 is a vacuum deposition system for precision coating.

The JEOL JBX-9500FS Electron Beam Lithography System can load substrates from 10 mm pieces to 300 mm wafers and write features less than 10 nm in size.

The CHA Mark 40 Criterion Solution is a vacuum deposition system in CHA Industries’ product line.

The CHA 1000 E-Beam is a deposition evaporator with an e-beam source and a 24 x 30" stainless steel bell jar.

The CHA SEC-600/SE-600 is a legacy system in CHA Industries' product lineup.

The CHA Mark 40 SR 10 E-Beam is an e-beam evaporator with a 6-inch wafer size.

The CHA VE 7710 is a thermal evaporator.

The CHA Mark-40 is a vacuum evaporation system described as combining features of the Mark 50 system with a broad array of options.

The CHA IG-100 is an ion gauge series used for pressure measurements within a chamber.

The CHA Mark 40 CV RH-PC/PLC is a vacuum evaporator.

The CHA Mark 40 C is an evaporator with a listed process chamber size of 26" x 26".

The CHA Mark 50 is an electron-beam evaporator used for thin film deposition.

The CHA 1000 is a 5-inch evaporator system with a 6-pocket E-gun, SR 10 power supply, and tri dome system.

The CHA Mark 50 is a physical vapor deposition (PVD) system for thin-film deposition, capable of handling 6-inch wafers.