YES
R3
What it is
How it works
The YES R3 uses plasma exposure to clean surfaces. The system accepts plasma gas inputs, includes a backfill input, and uses a sequential microprocessor to store multiple gas programs.[3]
The YES R3 includes a 500 watt power supply and two standard electrode sets. The system can be configured with an optional third plasma gas input.[3]
Where it fits in the process flow
The YES R3 is used on sample trays for pilot-run quantities. The listed capacity is two twelve by twelve inch sample trays with a total area of three hundred twenty-five square inches.[3]
Applications
The YES R3 is used for plasma cleaning in semiconductor processing and related laboratory workflows. The QSF uses the system as part of its wet processing and cleanroom tool set.[1][2]
- Plasma cleaning
What do the numbers mean?
Power & electrical2
Gas & chemistry6
- Process gas and modes (UC Santa Barbara configuration)
- Oxygen; downstream and direct plasma cleaning[1]
Control & software2
Configuration & options10
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Program storageUp to 90 separate one- or two-gas programs in memory[3]
- Power supply500 Watt[3]
- Plasma gas inputsTwo standard; optional third input[3]
- Power supply500 W[3]
- Plasma gas inputsTwo standard, optional third[3]
- ControllerSequential microprocessor; up to 90 stored one- or two-gas programs[3]
- Process gas and modes (UC Santa Barbara configuration)Oxygen; downstream and direct plasma cleaning[1]
- Stored programsUp to 90 separate one- or two-gas programs[3]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
How is the YES R3 controlled?
The YES R3 is controlled by a sequential microprocessor that allows up to ninety separate one or two gas programs to be entered and stored in memory.[3]
What power supply does the YES R3 use?
The YES R3 comes with a 500 watt power supply.[3]
What gas connections are provided on the YES R3?
The YES R3 provides two plasma gas inputs as standard, with an optional third plasma gas input, and it also includes a backfill input as standard.[3]
What sample capacity is given for the YES R3?
The YES R3 uses two twelve by twelve inch sample trays with a total capacity of three hundred twenty-five square inches.[3]
Not publicly documented
The following facts about the R3 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the R3 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the R3 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the R3 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the R3 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the R3 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]cnsi.ucsb.edu — cnsi.ucsb.educnsi.ucsb.edu
- [2]web.archive.org — web.archive.orgweb.archive.org
- [3]web.archive.org — web.archive.orgweb.archive.org
- [4]web.archive.org — web.archive.orgweb.archive.org
Last updated Oct 5, 2026.
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