Waferpedia

YES

58

Thermal / DiffusionYES 58 family
Research Quality: 40% complete
58 — Inventory photo
Fig. 0158Inventory photo[1]

Power

120 VAC[1]

Gas delivery

NH3 (ammonia)[4]

What it is

The YES 58 is a thermal processing oven in the diffusion category.[3]

The YES 58 is also used as an NH3 image reversal oven in photolithography workflows.[4]

How it works

The YES 58-TA oven uses NH3 gas to reverse the tone of positive photoresist.[4]

The chamber is purged of oxygen using vacuum and heat before it is filled with NH3 vapor at 500 Torr.[4]

Where it fits in the process flow

The reversal process supports the creation of an undercut profile in photoresist for lift-off processing.[4]

Applications

The YES 58 supports image reversal processing for positive photoresist.[4]

The YES 58 supports N2 bake processing.[4]

The YES 58 is compatible with Class A and B metals and compounds.[4]

What do the numbers mean?

Power & electrical5

Voltage
120 VAC[1]
Accurate?
50/60 Hz[1]
Accurate?
1700 Watts[1]
Accurate?
Power
1700 Watts[1]
Accurate?
Frequency
50/60 Hz[1]
Accurate?

Gas & chemistry1

Gas
NH3 (ammonia)[4]
Accurate?

Configuration & options6

14.2 A[1]
Accurate?
Manufacturer
YES[3]
Accurate?
Model
58[1]
Accurate?
Category
Thermal / Diffusion[3]
Accurate?
Current
14.2 A[1]
Accurate?
Process
Image reversal[4]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Voltage120 VAC[1]
  • Configuration50/60 Hz[1]
  • Configuration1700 Watts[1]
  • Power1700 Watts[1]
  • Frequency50/60 Hz[1]
  • GasNH3 (ammonia)[4]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What electrical input is specified for the YES 58?

The YES 58 is specified at 120 VAC, 50/60 Hz, 14.2 A, and 1700 Watts.[1][3]

What process gas does the YES 58 use for image reversal?

The YES 58-TA oven uses NH3 ammonia gas.[4]

What pressure is used for the NH3 step?

The NH3 vapor step uses 500 Torr.[4]

What type of resist process does the YES 58 support?

The YES 58 reverses the tone of positive photoresist and supports image reversal processing.[4]

What downstream patterning purpose does the YES 58 serve?

The YES 58 supports undercut profile formation for lift-off processing.[4]

Not publicly documented

The following facts about the 58 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 58 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 58 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 58 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 58 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 58 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]Inventory photo
  3. [3]waferpedia.com — waferpedia.comwaferpedia.com
  4. [4]cnfusers.cornell.edu — cnfusers.cornell.educnfusers.cornell.edu
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Last updated Oct 5, 2026.

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