Veeco

Savannah G 2

Q: What process modes does the Savannah G 2 offer?

The Savannah G 2 offers Continuous Mode and Exposure Mode.

Q: What precursor types can the Savannah G 2 handle?

The Savannah G 2 can handle solid, liquid, and gas precursors.

Deposition Veeco Savannah G 2 family

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This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The Veeco Savannah G 2 is an ALD deposition tool. The Veeco Savannah G 2 is available in S100, S200, and S300 configurations. The Veeco Savannah G 2 S300 supports substrates up to 300 mm.^[1]^[2]

Fig. — Manufacturer logo, not a photo of this toolWikimedia Commons (see file page for license)

Power

Integrated self contained ozone solution^[2]

Vacuum

LVPD system^[2]

Performance

<1% (1σ)^[2]

Gas delivery

2 lines standard, up to 6 lines available^[2]

What it is

The Veeco Savannah G 2 is an atomic layer deposition system.^[3]^[2]^[1]

The Savannah G 2 is a deposition tool for thin film processing.^[1]

How it works

The Savannah G 2 supports continuous mode and exposure mode.^[2]^[1]

The Savannah G 2 uses heated precursor lines and high-speed ALD valves.^[2]^[1]

Where it fits in the process flow

The Savannah G 2 supports clean room operation and batch processing.^[2]^[1]

Applications

The Savannah G 2 deposits oxide, doped oxide, nitride, metal, sulfide, and organic layers.^[2]

The Savannah G 2 supports self-assembled monolayers, particle coating, glove box integration, in-situ ellipsometry, in-situ quartz crystal microbalance, integrated ozone, and a plasma option.^[2]^[1]

What do the numbers mean?

Power & electrical1

Ozone generator: Integrated self contained ozone solution^[2]

Vacuum & pumping3

Power: 115 VAC or 220 VAC, 1900 W (excluding pump); S300 2000 W^[2]
Vacuum pump: Adixen 2021 C2 - 14.6 CFM (or higher on request)^[2]
Low vapor pressure delivery system: LVPD system^[2]

Wafer handling5

Substrate size: up to 300 mm for S300^[1]
Substrate size: Savannah S100: up to 100 mm; Savannah S200: up to 200 mm; Savannah S300: up to 300 mm^[2]
Maximum substrate temperature: S100: RT - 400 °C; S200: RT - 350 °C; S300: RT - 350 °C^[2]
Carrier/venting gas: N2 mass flow controlled, 100 SCCM^[2]
In-situ ellipsometry: For real time wafer-state metrology^[2]

Gas & chemistry2

Precursor cylinders: Individually heated 50 ml stainless steel cylinders, optional larger cylinders available^[2]
Precursor delivery lines: 2 lines standard, up to 6 lines available^[2]

Optics & imaging1

Operational modes: Continuous Mode™ (high speed) or Exposure Mode™ (ultra-high aspect ratio)^[2]

Performance1

Deposition uniformity (Al2O3): <1% (1σ)^[2]

Control & software2

Controls: LabVIEW™, Windows™ 7, Lenovo Laptop, USB control^[2]
Glove box interface: Integrated to allow direct loading from within a glove box^[2]

Configuration & options10

Product type: Deposition Tool^[1]
Process: Atomic Layer Deposition (ALD)^[3]
Configurations: S100, S200, S300^[1]
Cycle time: <2 seconds per cycle with Al2O3 at 200 °C^[2]
Compatibility: Clean room class 100 compatible^[2]
Compliance: CE, SEMI S2 optional^[2]
Ports: 2 lines standard, up to 6 lines available^[2]
Valves: High speed ALD valves with 10 msec response time^[2]
In-situ QCM: For rapid process diagnostic and optimization^[2]
Type of product: Deposition Tool^[1]

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Power115 VAC or 220 VAC, 1900 W (excluding pump); S300 2000 W^[2]
Vacuum pumpAdixen 2021 C2 - 14.6 CFM (or higher on request)^[2]
Precursor cylindersIndividually heated 50 ml stainless steel cylinders, optional larger cylinders available^[2]
Low vapor pressure delivery systemLVPD system^[2]
Ozone generatorIntegrated self contained ozone solution^[2]
Precursor delivery lines2 lines standard, up to 6 lines available^[2]

Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What process modes does the Savannah G 2 offer?

The Savannah G 2 offers Continuous Mode and Exposure Mode.^[2]^[1]

What precursor types can the Savannah G 2 handle?

The Savannah G 2 can handle solid, liquid, and gas precursors.^[2]^[1]

Not publicly documented

The following facts about the Savannah G 2 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Savannah G 2 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Savannah G 2 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Savannah G 2 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Savannah G 2 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Savannah G 2 is not on record.
Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (3)Every fact above is drawn from these public sources

[1]atomiclayerdeposition.com — atomiclayerdeposition.comatomiclayerdeposition.com
[2]gammadata.se — gammadata.segammadata.se
[3]Equipment inventory listing