Tystar
Tytan 1600 LPCVD
What it is
The Tytan 1600 is configured as a carbon nanotube (CNT) growth system. The system includes a complete set of process quartzware capable of processing up to 32 sheets of 200 mm by 200 mm substrates. The system has a six-zone resistance heating furnace with process temperature capability up to 900 degrees Celsius. Mass flow controlled gas lines provide five gas lines with individual flow rate controls. The system operates at low pressure, controlled from 50 Torr to 700 Torr, and includes a dry vacuum pump and capacitance manometers for 10 Torr and 1000 Torr. Control is provided by CVDWinPrC PC-based process control software.[2]
How it works
The Tytan 1600 uses a six-zone resistance heating furnace for precise temperature control. The process tube is heated to temperatures up to 900 degrees Celsius. The system has five mass flow controlled gas lines with individual flow rate controls. A pre-heated gas line heats the gas to 150 degrees Celsius before entering the process chamber. The system operates at low pressure using capacitance manometers for 10 Torr and 1000 Torr, and low pressure control is possible from 50 Torr to 700 Torr. A dry vacuum pump and vacuum bypass valve allow for atmospheric operation. An air pump removes carbon deposits from the process tube. The system includes a rolling resistance furnace for rapid heating and cooling.[2]
Where it fits in the process flow
What do the numbers mean?
Power & electrical1
Vacuum & pumping2
- Edwards iH Dry Pumping System[1]
Wafer handling1
Gas & chemistry1
Configuration & options5
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Tytan 1600 LPCVD Carbon Nanotube Growth | — | — | Includes rolling resistance furnace with six-zone heating, pre-heated gas line to 150°C, dry scrubber (Jupiter Scientific Callisto), dry pumping system (Edwards iH), and air-to-water heat exchanger; configured for carbon nanotube synthesis with process quartzware for 200mm x 200mm substrates up to 32 sheets. | semistarcorp.com[2] |
| Mini Tytan 1600 Horizontal Furnace, 1 Stack, 150 mm, LPCVD | — | — | Reduced footprint, single tube (1 stack), 150mm wafer size, 50 wafer capacity, 18 inch flat zone; includes host supervisor and loading assist arm; configured for LPCVD. | semistarcorp.com[3] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What wafer size does the Tytan 1600 support?
One variant of the Tytan 1600 supports 150 mm wafers. Another variant processes 200 mm by 200 mm sheet substrates.[3][2]
How many gas lines does the system include?
The carbon nanotube growth configuration includes five mass flow controlled gas lines with individual flow rate controls.[2]
What is the wafer capacity for the 150 mm variant?
The 150 mm variant has a 50-wafer capacity.[3]
What is the low pressure control range?
The system controls low pressure from 50 Torr to 700 Torr.[2]
Not publicly documented
The following facts about the Tytan 1600 LPCVD are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Tytan 1600 LPCVD are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Tytan 1600 LPCVD are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Tytan 1600 LPCVD are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Tytan 1600 LPCVD is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Tytan 1600 LPCVD are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]semistarcorp.com — semistarcorp.comsemistarcorp.com
- [3]semistarcorp.com — semistarcorp.comsemistarcorp.com
Last updated Sep 22, 2026.
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