Tokyo Electron
Expedius I Batch
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Tokyo Electron Expedius I Batch Cleaner is a batch cleaning system designed for 12-inch (300mm) wafers.[1]
What it is
General reference — not yet source-verifiedBatch wet processing tools clean multiple wafers simultaneously by immersing them in chemical solutions to remove particles, residues, and native oxides.
How it works
General reference — not yet source-verifiedBatch wet cleaning systems immerse cassettes of wafers in a sequence of chemical baths designed to remove particulate contamination, metallic impurities, and native oxides. Typical chemistries include alkaline peroxide mixtures (such as standard clean one) and acid peroxide mixtures (such as standard clean two), followed by dilute hydrofluoric acid baths. After the wet chemical steps, the wafers are rinsed with deionized water and dried, often using isopropyl alcohol vapor or spin drying.
Applications
General reference — not yet source-verifiedTypical applications include pre-gate oxidation cleaning, post-etch residue removal, pre-metal deposition cleaning, and surface conditioning for epitaxial growth. The batch configuration is well suited for high-volume manufacturing where throughput benefits from processing multiple wafers simultaneously.
What do the numbers mean?
Wafer handling1
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Expedius I Batch are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the Expedius I Batch are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Expedius I Batch are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Expedius I Batch are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Expedius I Batch are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Expedius I Batch are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
Last updated Oct 11, 2026.
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