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Tokyo Electron

Clean Track ACT 8 Multi Block

Provisional entry — research in progress

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Tokyo Electron logo
Fig. — Manufacturer logo, not a photo of this toolWikimedia Commons (see file page for license)

Gas delivery

Multi Block (Resist Coater/Developer)[2]

Optics

Soft-bake and post-exposure bake[3]

What it is

The Tokyo Electron Clean Track ACT 8 Multi Block is a resist processing tool in the lithography and photoresist category. The machine is a multi block coater and developer track.[1][2][4]

The Clean Track ACT 8 Multi Block is a photoresist spin-coater and developer track. The tool belongs to the class of wafer coat-develop systems used to apply resist, bake it, and develop patterned resist in support of lithography.[3]

Applications

The Clean Track ACT 8 Multi Block is used for wafer photoresist processing in semiconductor lithography. The equipment is used for spin coating and developing resist films that support pattern transfer.[3][1][2]

What do the numbers mean?

Wafer handling2

Wafer configuration
200mm[1]
Accurate?
Wafer Size
200mm[4]3 sources
Accurate?

Gas & chemistry6

Type
Multi Block (Resist Coater/Developer)[2]
Accurate?
Equipment class
Resist Processing Equipment[1]
Accurate?
Purpose
Photoresist spin-coater and developer[3]
Accurate?
Resist Types
Negative tone and positive tone[3]
Accurate?
Pre-wet Solvents
Cyclopentanone or HMDS[3]
Accurate?
Equipment Type
Resist Processing Equipment / Multi Block (Resist Coater/Developer)[1]
Accurate?

Optics & imaging1

Bake Capabilities
Soft-bake and post-exposure bake[3]
Accurate?

Control & software1

Interface
Direct interface with ASML stepper[3]
Accurate?

Configuration & options6

Date of Manufacture
1997-12-31[1]
Accurate?
Currently Configured for
200mm[1]
Accurate?
OEM
Tokyo Electron[2]
Accurate?
Model
Clean Track ACT 8 Multi Block[1]
Accurate?
Date of manufacture
2017-01-01[2]
Accurate?
Supported Resists
KMPR-1005 (1002), OIR-647-17(11)[3]
Accurate?

Observed configurations

How individual machines were equipped when they appeared on the secondary market — as listed, per unit. These describe one specific machine, not the model in general.

Unit as listed[1]

  • 200mm

Vintage & configurations

  1. 1997-12-31Date of manufacture[1]

    Date of manufacture stated as 1997-12-31.

  2. 2017-01-01Date of manufacture[2]

    Date of manufacture stated as 2017-01-01.

Documented models & variants

DesignationGenerationVintageChangesSource
ACT8 Multi Block 3C/3D——Described as a specific configuration of the ACT8 Multi Block currently running in productionmacquarie.com[2]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • TypeMulti Block (Resist Coater/Developer)[2]
  • Equipment classResist Processing Equipment[1]
  • PurposePhotoresist spin-coater and developer[3]
  • Resist TypesNegative tone and positive tone[3]
  • Pre-wet SolventsCyclopentanone or HMDS[3]
  • Equipment TypeResist Processing Equipment / Multi Block (Resist Coater/Developer)[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What is the Clean Track ACT 8 Multi Block?

The Clean Track ACT 8 Multi Block is a multi block resist coater and developer for semiconductor resist processing.[1][3][2][4]

Not publicly documented

The following facts about the Clean Track ACT 8 Multi Block are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • The control-system platform and OS era of the Clean Track ACT 8 Multi Block are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Clean Track ACT 8 Multi Block are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Clean Track ACT 8 Multi Block is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the Clean Track ACT 8 Multi Block are on record.

    Answerable by: an OEM parts catalog or a service engineer

  • No publicly hosted manuals, SOPs, or datasheets for the Clean Track ACT 8 Multi Block are on record.

    Answerable by: university cleanroom staff or an OEM application specialist

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Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]wotol.comwotol.com
  2. [2]macquarie.com — macquarie.commacquarie.com
  3. [3]c2mi.ca — c2mi.cac2mi.ca
  4. [4]fabsurplus.com — fabsurplus.comfabsurplus.com
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Last updated Oct 10, 2026.

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