Tokyo Electron
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The Alpha 85 Z is a thermal/diffusion furnace manufactured by Tokyo Electron. The Alpha 85 Z handles 8-inch wafers. The Alpha 85 Z is configured for POCL3 processing.[1]
The Tokyo Electron Alpha 85 Z is a diffusion furnace classified under the Thermal / Diffusion equipment category. Diffusion furnaces are used in semiconductor manufacturing for processes such as thermal oxidation, dopant diffusion, and annealing of silicon wafers.
The furnace process is typically preceded by a cleaning step (e.g., RCA clean) and may be followed by a drive-in anneal or oxidation step to activate and diffuse the dopant further.
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The following facts about the Alpha 85 Z are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Alpha 85 Z are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Alpha 85 Z are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Alpha 85 Z are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Alpha 85 Z are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Alpha 85 Z is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 4, 2026.
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