Waferpedia

Tokyo Electron

Alpha 6 S

DepositionTokyo Electron Alpha family
Research Quality: 40% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

Alpha 6 S — Inventory photo
Fig. 01Alpha 6 SInventory photo[2]

Vacuum

Gas in vacuum state chamber[1]

Gas delivery

Chemical Vapor Deposition (CVD)[2]

What it is

The Tokyo Electron Alpha 6 S is a chemical vapor deposition (CVD) system used in semiconductor manufacturing. The Alpha 6 S is designed for low-pressure silicon nitride (LP SIN) deposition on wafers. The Alpha 6 S processes wafers in a batch mode, with gases introduced into a vacuum state chamber.[1][2]

What do the numbers mean?

Vacuum & pumping3

Gas in vacuum state chamber[1]
Accurate?
Chamber type
Gas in vacuum state chamber[1]
Accurate?
Deposited film
Low-pressure silicon nitride (LP SIN)[2]
Accurate?

Wafer handling1

Wafer size
8 inch[2]
Accurate?

Gas & chemistry1

Process type
Chemical Vapor Deposition (CVD)[2]
Accurate?

Configuration & options3

Batch processing[1]
Accurate?
LP SIN[2]
Accurate?
Processing type
Batch[1]
Accurate?

Vintage & configurations

  1. 2000Vintage year (base model)[1]

    Equipment vintage year stated as 2000

  2. 2011Vintage year (CVD variant)[2]

    Equipment vintage year for CVD variant stated as 2011

Documented models & variants

DesignationGenerationVintageChangesSource
Alpha 6 S CVD (Chemical Vapor Deposition)—2011CVD version; source also states 8 inch and LP SIN 2011 vintage.Equipment inventory listing[2]
Alpha 6 S CVD—2011Identified as Chemical Vapor Deposition (CVD); source states 8-inch wafer size and LP SIN 2011 vintage.Equipment inventory listing[2]
Interested in this tool?
Need help with this tool?Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ConfigurationGas in vacuum state chamber[1]
  • Chamber typeGas in vacuum state chamber[1]
  • Process typeChemical Vapor Deposition (CVD)[2]
  • Deposited filmLow-pressure silicon nitride (LP SIN)[2]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Worked with this tool? Help preserve its knowledge →

Frequently asked questions

What is the chamber environment during deposition on the Alpha 6 S?

The Alpha 6 S introduces gases into a vacuum state chamber.[1]

Not publicly documented

The following facts about the Alpha 6 S are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • The control-system platform and OS era of the Alpha 6 S are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Alpha 6 S are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Alpha 6 S is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the Alpha 6 S are on record.

    Answerable by: an OEM parts catalog or a service engineer

  • No publicly hosted manuals, SOPs, or datasheets for the Alpha 6 S are on record.

    Answerable by: university cleanroom staff or an OEM application specialist

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
Was this page accurate?

Last updated Sep 1, 2026.

Compare with similar tools

View all →