Oxford Instruments
Plasmalab-80plus-Cloey-S
The Oxford Instruments Plasmalab-80plus-Cloey-S is an open load reactive ion etch system. The Oxford Instruments Plasmalab-80plus-Cloey-S is used for etching compound semiconductors and metals. The Oxford Instruments Plasmalab-80plus-Cloey-S is designed for 100 mm wafers.[1][2]
What it is
General reference — not yet source-verifiedThe Oxford Instruments Plasmalab-80plus-Cloey-S is a reactive ion etch (RIE) system designed for open-load operation. The system is classified as a dry etch tool for semiconductor processing.
How it works
Applications
The system supports wafer sizes up to 100 mm designed, with a maximum of 200 mm. Samples smaller than 100 mm and irregularly shaped pieces can be placed directly on the 238 mm platen.[1][2]
- Etching compound semiconductors
- Etching metals
What do the numbers mean?
Power & electrical1
Vacuum & pumping1
Wafer handling1
Gas & chemistry8
Configuration & options2
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Process gasesBCl3, Cl2, N2, CF4, O2, Ar[1]
- Allowed masksPhotoresist and dielectrics[1]
- Power range< 270 Watts[1]
- MFC flow range - BCl30 – 100 sccm[1]
- MFC flow range - Cl20 – 50 sccm[1]
- MFC flow range - CF40 – 100 sccm[1]
- MFC flow range - O20 – 50 sccm[1]
- MFC flow range - Ar0 – 100 sccm[1]
- MFC flow range - N20 – 100 sccm[1]
- Pressure range< 250 mTorr[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the Plasmalab-80plus-Cloey-S are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Plasmalab-80plus-Cloey-S are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Plasmalab-80plus-Cloey-S are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Plasmalab-80plus-Cloey-S are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Plasmalab-80plus-Cloey-S are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Plasmalab-80plus-Cloey-S is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]cores.research.asu.edu — cores.research.asu.educores.research.asu.edu
- [2]Plasmalab-80plus-Cloey-S — Oxford Instruments | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 11, 2026.
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