Onto Innovation

Wafer size
2"
Optics
785nm and almost new 532nm lasers[2]
The Onto Innovation RPM 2000 PL Mapper is a semiconductor metrology and inspection tool.
The RPM 2000 PL Mapper can use laser excitation, white light for thickness measurements, and detector channels suited to a broad sensitivity range.[2]
A PL mapper is used in wafer characterization rather than in pattern transfer or material deposition.
PL mapping is used for compound semiconductor and optoelectronic wafer inspection where spatial variation in luminescence and thickness is relevant.
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The following facts about the RPM 2000 PL Mapper are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the RPM 2000 PL Mapper are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the RPM 2000 PL Mapper are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the RPM 2000 PL Mapper are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the RPM 2000 PL Mapper are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the RPM 2000 PL Mapper is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 8, 2026.
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