Nikon
Eclipse LV 150
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Nikon Eclipse LV 150 is a microscope.[1]
What it is
The Nikon Eclipse LV 150 is a microscope manufactured by Nikon.[1]
How it works
General reference — not yet source-verifiedThe Eclipse LV 150 operates on the principle of reflected-light optical microscopy. An incident light source illuminates the sample from above, and the reflected light is collected through objective lenses to form a magnified image.
Where it fits in the process flow
General reference — not yet source-verifiedIn a semiconductor fabrication facility, inspection microscopes are typically used after photolithography, etching, deposition, or other process steps to inspect wafers for defects, alignment accuracy, and surface quality.
What do the numbers mean?
Configuration & options8
- with accessories[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of illumination does this class of microscope use?General reference — not yet source-verified
Machines of this class support multiple illumination modes including brightfield, darkfield, and differential interference contrast (DIC), often switchable via motorized filter cubes or turrets, to enhance contrast on different material surfaces.
How is measurement repeatability ensured in such systems?General reference — not yet source-verified
Repeatability comes from a vibration-dampened frame, high-resolution motorized stage encoders, and closed-loop autofocus that compensates for focus drift. Class-level software applies sub-pixel interpolation for edge detection.
Are these microscopes compatible with automated wafer handling?General reference — not yet source-verified
Typically yes; they can be integrated with robotic wafer loaders and cassette indexers for unattended operation, though specifics depend on the fab configuration.
What kind of training is needed to operate such equipment?General reference — not yet source-verified
Operators typically require training in basic microscopy, sample handling, and the specific measurement recipe software. Fab engineers may need deeper knowledge of optical alignment and calibration procedures.
Can these machines measure transparent films or photomasks?General reference — not yet source-verified
Yes. With transmitted-light capability (for transparent substrates) and reflected light for opaque layers, they can measure film thickness by reflectance spectroscopy or critical dimensions on photomasks using DIC.
Not publicly documented
The following facts about the Eclipse LV 150 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Eclipse LV 150 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Eclipse LV 150 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Eclipse LV 150 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Eclipse LV 150 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Eclipse LV 150 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]epfl.ch — epfl.chepfl.ch
Last updated Oct 11, 2026.
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