MKS
Ozone
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
How it works
Where it fits in the process flow
The MKS ozone family is used in semiconductor thin-film processes such as Atomic Layer Deposition, Chemical Vapor Deposition, Atomic Layer Etch, oxide growth, and photoresist removal.[2][4][3]
Applications
The MKS ozone family is used for semiconductor thin-film deposition and related oxidation processes.[2]
The AX8415 supports semiconductor, flat panel display, and photovoltaic applications.[4]
The O3CS supports thin-film processes that use ozone with metal oxides such as Al2O3, ZrO2, HfO2, and La2O3.[3]
What do the numbers mean?
Power & electrical1
Configuration & options3
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Product family contextOzone generators and systems[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What process families does the MKS ozone product family support?
The MKS ozone product family supports Atomic Layer Deposition, Chemical Vapor Deposition, Atomic Layer Etch, oxide growth, and photoresist removal.[2][4][3]
What gases can feed the O3CS ozone compact system?
The O3CS uses Grade 6 or better oxygen, and it can use nitrogen or carbon dioxide as an additional gas species.[3]
What is the ozone output capability of the AX8415?
The AX8415 produces ozone up to 425 g/Nm3, or 27.1 wt% at 5°C at 2.5 slm with nitrogen.[4]
What controls are integrated into the O3CS ozone delivery system?
The O3CS includes an integrated ozone concentration monitor, flow control for oxygen and dopant gas species, an electronic pressure controller, and closed-loop ozone concentration control.[3]
Not publicly documented
The following facts about the Ozone are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Ozone are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Ozone are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Ozone are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Ozone are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Ozone is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]api.p1.mks.com — api.p1.mks.comapi.p1.mks.com
- [3]https://api.p1.mks.com/mam/celum/celum_assets/resources/O3CS-DS.pdf?3 — api.p1.mks.comapi.p1.mks.com
- [4]https://api.p1.mks.com/mam/celum/celum_assets/resources/AX8415-DS.pdf?1 — api.p1.mks.comapi.p1.mks.com
Last updated Oct 7, 2026.