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Logitech

CP3000

CMPLogitech CP3000 family
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CP3000 — web.archive.org
Fig. 01CP3000web.archive.org[1]
  • Plate 01Logitech CP3000 (CMP) Chemical Mechanical Polisher

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What it is

The Logitech CP3000 is a chemical polishing and chemical mechanical polishing system designed for precision processing of semiconductor and optical materials.[2][3]

The CP3000 is a gear-driven system for polishing and etching of advanced materials, supporting a range of semiconductor and optical crystals.[2][3]

How it works

The CP3000 uses a gear drive mechanism to rotate samples in planetary gears around a central drive for fine etching and polishing of thin and ultra-thin wafers.[2][3]

A joystick-controlled panel allows operation of the system, and components include a corrosion-resistant chemical feed unit, drain tank, and removable PVC drip tray.[2][3]

The system supports both aggressive polishing and less aggressive Chemlox polishing tasks.[2][3][4]

Where it fits in the process flow

The CP3000 integrates with Logitech bonding and demounting equipment to protect delicate wafers from front-side damage during processing.[2][3]

The compact design of the CP3000 fits most fume cabinets, with an optional Logitech fume cabinet and external control panel placement.[2][3]

Applications

The CP3000 is used for fine etching of semiconductor wafers made from Gallium Arsenide, Indium Phosphide, and other II-VI and III-V compounds, as well as for polishing delicate electro-optic crystals.[2][3][4]

CMP applications include tribology science and research, such as coefficient of friction (CoF) monitoring, and adaptation for Microelectromechanical Systems (MEMS) fabrication, including polysilicon surface micromachining and Opto-MEMS and Bio-MEMS packaging.[2][4]

  • Handling and filtration of toxic gases, vapours, particles and odours
  • Fine prime face polishing of semiconductor wafers
  • Processing of other electronic and opto-electronic crystals
  • Use with bromine methanol and alkaline or acid etches
  • Semiconductor materials
  • Optical polishing and processing of optical components

What do the numbers mean?

Power & electrical4

Fan type
EBM R2E-190-AO26-05 230V 50Hz dynamically balanced centrifugal[1]
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Power consumption
45 Watts[1]
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Supply amps
5.0[1]
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Voltage
230V ± 10% 50 Hz[1]
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Gas & chemistry1

Recommended use
Ideal for use with a Logitech CP3000 Chemical Polishing Machine[1]
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Dimensions & facilities1

Net weight
75 kg[1]
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Configuration & options12

Cabinet model
1CP3AC-0100[1]
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Construction
Steel protected with an anti-acid polyethylene coating[1]
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Transparent elements
Acrylic panels[1]
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Temperature range
15°C to 32°C[1]
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Humidity
Max RH 80% for temperatures up to 31°C[1]
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Filter type
OS 4 Pre-Filter 1; Organic Vapours Secondary acids Enviro Carbon Filter (OS); Acid Vapours Secondary Organic acids Enviro Carbon Filter (H+)[1]
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Volume of air
130 m3/hr[1]
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Face velocity
>0.5 m/s[1]
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Opening type
Teardrop[1]
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Airflow alarm
AMS programmable electronic with audible as an option[1]
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Lighting
Integrated lighting up to 19W, available as an option[1]
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Sound level
< 50 dBA at 1 metre[1]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Recommended useIdeal for use with a Logitech CP3000 Chemical Polishing Machine[1]
  • Fan typeEBM R2E-190-AO26-05 230V 50Hz dynamically balanced centrifugal[1]
  • Power consumption45 Watts[1]
  • Supply amps5.0[1]
  • Voltage230V ± 10% 50 Hz[1]

Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What is the wafer capacity of the CP3000?

The CP3000 can process up to three 75 mm (3-inch) wafers or three 100 mm (4-inch) wafers.[2][3]

What is the polishing plate diameter?

The polishing plate diameter is 356 mm (14 inches).[2][3]

What power supply options are available?

The CP3000 is available with a 220-240V, 50Hz or a 110V, 50/60Hz power supply.[2][3]

What materials can be processed on the CP3000?

The CP3000 is compatible with semiconductor materials such as Gallium Arsenide and Indium Phosphide, as well as electro-optic crystals.[2][3]

What are the dimensions of the main drive unit?

The main drive unit (with feed system) measures 660 mm in height, 7415 mm in depth (likely a typo for 415 mm), and 415 mm in width.[2][3]

Not publicly documented

The following facts about the CP3000 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the CP3000 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the CP3000 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the CP3000 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the CP3000 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the CP3000 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]web.archive.org — web.archive.orgweb.archive.org
  2. [2]CP3000 Chemical Polishing System for Precision Wafer Processing — logitech.uk.comlogitech.uk.com
  3. [3]CP3000 Chemical & Chemical Mechanical Polishing | Logitech — logitech.uk.comlogitech.uk.com
  4. [4]CP3000 Chemical & Chemical Mechanical Polishing by Logitech Limited | Albus — diagon.aidiagon.ai
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Last updated Sep 26, 2026.

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