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CEE

100CB

Spinner/Hotplate4"CEE 100CB family
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100CB — nanofab.ece.cmu.edu
Fig. 01100CBnanofab.ece.cmu.edu[1]

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Wafer size

4"

Vacuum

Mounted in an exhausted custom hood[1]

Gas delivery

Standard positive photoresists only[1]

What it is

The CEE 100CB handles substrates from 1 cm² to 4-inch wafers. The tool is intended for use with standard positive photoresists only.[1][2]

Two mounting configurations are available for the CEE 100CB. The table top version is mounted in an exhausted custom hood. The bench mounted version is mounted in an exhausted wet bench.[1][2]

How it works

The CEE 100CB is programmable with up to 10 process steps. The tool has a spin speed up to 5000 rpm. The hotplate is a programmable vacuum hotplate for baking photoresist.[1][2]

Where it fits in the process flow

General reference — not yet source-verified

The CEE 100CB is positioned in the photolithography process flow for applying and pre-baking photoresist before exposure. After spin coating, the substrate is typically baked on the hotplate to remove solvents. The tool can also be used for post-exposure baking.

What can it run?

Process applications and technology nodes documented for this tool.

  • Photoresist baking
  • Spinning substrates

What do the numbers mean?

Vacuum & pumping6

Hotplate
Programmable vacuum hotplate for baking photoresist[1]
Accurate?
Mounting
Mounted in an exhausted custom hood[1]
Accurate?
Mounting
Mounted in an exhausted wet bench[2]
Accurate?
Hotplate type
Programmable vacuum hotplate for baking photoresist[1]
Accurate?
Mounting variants
Table top (exhausted custom hood) or bench mount (exhausted wet bench)[2]
Accurate?
Mounting variants
Table top (exhausted custom hood) and Bench mount (exhausted wet bench)[1]
Accurate?

Wafer handling2

Substrate range
1 cm² to 4" wafers[1]
Accurate?
Substrate size range
1 cm² to 4-inch wafers[1]
Accurate?

Gas & chemistry2

Photoresist compatibility
Standard positive photoresists only[1]
Accurate?
Photoresist type
Standard positive photoresists only[1]
Accurate?

Configuration & options9

Model
100CB[3]
Accurate?
OEM
CEE[3]
Accurate?
Machine type
Table Top Spinner/Hotplate[1]
Accurate?
Machine type
Bench Mounted Spinner/Hotplate[2]
Accurate?
Spin speed
Up to 5000 rpm[1]
Accurate?
Process steps
Programmable with up to 10 process steps[1]
Accurate?
Maximum spin speed
5000 rpm[1]
Accurate?
Programmable process steps
Up to 10[1]
Accurate?
Programmable steps
Up to 10 process steps[1]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
CEE 100CB Table Top Spinner/Hotplate——Table-top configuration; mounted in an exhausted custom hood.nanofab.ece.cmu.edu[1]
CEE 100CB Bench Mounted Spinner/Hotplate——Bench-mounted configuration; mounted in an exhausted wet bench.nanofab.ece.cmu.edu[2]
CEE 100CB Bench Mount Spinner/Hotplate——Mounted in an exhausted wet benchnanofab.ece.cmu.edu[2]
CEE 100CB Table Top——Mounted in an exhausted custom hoodnanofab.ece.cmu.edu[1]
CEE 100CB Bench Mount——Mounted in an exhausted wet benchnanofab.ece.cmu.edu[2]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Photoresist compatibilityStandard positive photoresists only[1]
  • HotplateProgrammable vacuum hotplate for baking photoresist[1]
  • MountingMounted in an exhausted custom hood[1]
  • MountingMounted in an exhausted wet bench[2]
  • Photoresist typeStandard positive photoresists only[1]
  • Hotplate typeProgrammable vacuum hotplate for baking photoresist[1]
  • Mounting variantsTable top (exhausted custom hood) or bench mount (exhausted wet bench)[2]
  • Mounting variantsTable top (exhausted custom hood) and Bench mount (exhausted wet bench)[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

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Frequently asked questions

What substrate sizes does the CEE 100CB handle?

The CEE 100CB handles substrates from one square centimeter to four-inch wafers.[1][2]

What photoresists is the CEE 100CB intended for?

The CEE 100CB is to be used for standard positive photoresists only.[1][2]

How many process steps can the CEE 100CB be programmed to run?

The CEE 100CB can be programmed with up to ten process steps.[1][2]

What hotplate function does the CEE 100CB include?

The CEE 100CB includes a programmable vacuum hotplate for baking photoresist.[1][2]

Not publicly documented

The following facts about the 100CB are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 100CB are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the 100CB are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 100CB are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 100CB is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the 100CB are on record.

    Answerable by: an OEM parts catalog or a service engineer

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]nanofab.ece.cmu.edu — nanofab.ece.cmu.edunanofab.ece.cmu.edu
  2. [2]nanofab.ece.cmu.edu — nanofab.ece.cmu.edunanofab.ece.cmu.edu
  3. [3]nanofab.ece.cmu.edu — nanofab.ece.cmu.edunanofab.ece.cmu.edu
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Last updated Oct 3, 2026.