Canon
FPA 2500 i 3 i-Line
The Canon FPA 2500 i 3 is an i-line stepper for 8-inch wafers. The Canon FPA 2500 i 3 uses a 5-inch reticle. The Canon FPA 2500 i 3 was manufactured in 1993.[1][2][3]
What it is
The Canon FPA 2500 i 3 is an i-line stepper used for photolithography. The FPA 2500 i 3 processes wafers of eight-inch size. The FPA 2500 i 3 accepts reticles of five-inch size. The FPA 2500 i 3 uses notch-type wafers. The FPA 2500 i 3 employs a ring-style wafer chuck. The FPA 2500 i 3 is configured with left-hand auto feed. The FPA 2500 i 3 supports a track interface. The FPA 2500 i 3 runs software version VS 5.26 BW.[1][2][3]
What do the numbers mean?
Wafer handling5
Optics & imaging6
- Lens Data:[1]
Performance4
Control & software5
- Software version; VS 5.26 BW[1]
Configuration & options8
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Nikon NSR 2205 i 12 D i-Line— Same function class: Lithography, nullCompare in depthsource[5]
- Nikon NSR 2205 i 11 D i-Line— Same function class: Lithography, nullCompare in depthsource[6]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the typical resolution capability of an i-line stepper?General reference — not yet source-verified
i-line steppers can resolve features down to approximately several hundred nanometers, depending on the lens numerical aperture and process conditions, making them suitable for many non-critical and mature-node applications.
How does the throughput of an i-line stepper compare to advanced scanners?General reference — not yet source-verified
i-line steppers generally offer moderate throughput, adequate for high-volume production of mature nodes, though they are slower per wafer than modern deep-ultraviolet scanners due to the step-and-repeat methodology and lamp-based illumination.
What is the typical overlay accuracy of an i-line stepper?General reference — not yet source-verified
Overlay accuracy for i-line steppers is specified by the manufacturer and is generally sufficient for the layer-to-layer alignment requirements of mature-node designs, often on the order of a fraction of the critical dimension.
Not publicly documented
The following facts about the FPA 2500 i 3 i-Line are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the FPA 2500 i 3 i-Line are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the FPA 2500 i 3 i-Line are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the FPA 2500 i 3 i-Line are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the FPA 2500 i 3 i-Line are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the FPA 2500 i 3 i-Line is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (6)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]inventory listing
- [4]Inventory photo
- [5]Equipment inventory listing
- [6]Equipment inventory listing
Last updated Sep 29, 2026.
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The Nikon NSR 2205 i 11 D i-Line Stepper is a Nikon lithography stepper specified for 4-inch wafers.
The Nikon NSR 2205 i 12 D is an i-line stepper used in photolithography, available in 6-inch and 8-inch wafer configurations.