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Canon

Anelva C 7100 PVD Cluster

DepositionCanon Anelva family
Research Quality: 40% complete

The Canon Anelva C7100 PVD Cluster is a physical vapor deposition system for 8-inch wafers. The Canon Anelva C7100 PVD Cluster includes triple transfer chambers with Brooks Magna-Tran robots. The Canon Anelva C7100 PVD Cluster features multiple process modules including CIS CH-A, Etch/OXI-EX, 8PVD-EX, 5PVD-EX, Cooling, RTA, and others.[1]

Canon logo
Fig. — Manufacturer logo, not a photo of this toolWikimedia Commons (see file page for license)

What it is

The Canon Anelva C 7100 PVD Cluster is a physical vapor deposition system for semiconductor processing.[1][2]

The Canon Anelva C 7100 is configured for eight-inch wafers.[1]

How it works

The Canon Anelva C 7100 includes triple transfer chambers with a loadlock and cluster-to-cluster transport, and the system uses Brooks Magna-Tran robots for wafer movement between modules.[1]

The Canon Anelva C 7100 includes multiple process modules, including CIS CH-A, Etch/OXI-EX CH-B, 8PVD-EX CH-E, 5PVD-EX CH-F, 8PVD-EX CH-1A, Cooling CH-1B, RTA CH-1C, 4/4PVD-1D, and 4PVD-EX CH-1F.[1]

Applications

The Canon Anelva C 7100 is used for sputtering deposition and related physical vapor deposition workflows.[2][1]

What do the numbers mean?

Vacuum & pumping14

CIS CH-A process module w/ Shimadzu TMP turbo pump[1]
Accurate?
Etch/OXI-EX (CH-B) process module w/ Inficon Transpector XPR3 RGA, Shimadzu TMP-3203LM-N1 turbo pump[1]
Accurate?
8PVD-EX (CH-E) process module w/ CTI Cryogenics PowerEco cryopump[1]
Accurate?
5PVD-EX (CH-F) process module w/ Shimadzu TMP turbo pump[1]
Accurate?
8PVD-EX (CH-1A) process module, w/ cryopump[1]
Accurate?
4/4PVD-1D process module w/ Anelva P-126CL turbopump[1]
Accurate?
4PVD-EX (CH-1F) process module w/ CTI Cryogenics PowerEco cryopump[1]
Accurate?
Process module CH-A
CIS CH-A process module with Shimadzu TMP turbo pump[1]
Accurate?
Process module CH-B
Etch/OXI-EX (CH-B) process module with Inficon Transpector XPR3 RGA, Shimadzu TMP-3203LM-N1 turbo pump[1]
Accurate?
Process module CH-E
8PVD-EX (CH-E) process module with CTI Cryogenics PowerEco cryopump[1]
Accurate?
Process module CH-F
5PVD-EX (CH-F) process module with Shimadzu TMP turbo pump[1]
Accurate?
Process module CH-1A
8PVD-EX (CH-1A) process module with cryopump[1]
Accurate?
Process module CH-1D
4/4PVD-1D process module with Anelva P-126CL turbopump[1]
Accurate?
Process module CH-1F
4PVD-EX (CH-1F) process module with CTI Cryogenics PowerEco cryopump[1]
Accurate?

Wafer handling3

Triple transfer chambers (loadlock/cluster 1, cluster-to-cluster, cluster 2) w/ Brooks Magna-Tran robots[1]
Accurate?
Wafer size
8 inch[1]
Accurate?
Transfer chambers
Triple transfer chambers (loadlock/cluster 1, cluster-to-cluster, cluster 2) with Brooks Magna-Tran robots[1]
Accurate?

Configuration & options4

Cooling (CH-1B) process module[1]
Accurate?
RTA (CH-1C) process module, w/[1]
Accurate?
Cooling module CH-1B
Cooling (CH-1B) process module[1]
Accurate?
RTA module CH-1C
RTA (CH-1C) process module[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ConfigurationCIS CH-A process module w/ Shimadzu TMP turbo pump[1]
  • ConfigurationEtch/OXI-EX (CH-B) process module w/ Inficon Transpector XPR3 RGA, Shimadzu TMP-3203LM-N1 turbo pump[1]
  • Configuration8PVD-EX (CH-E) process module w/ CTI Cryogenics PowerEco cryopump[1]
  • Configuration5PVD-EX (CH-F) process module w/ Shimadzu TMP turbo pump[1]
  • Configuration8PVD-EX (CH-1A) process module, w/ cryopump[1]
  • Configuration4/4PVD-1D process module w/ Anelva P-126CL turbopump[1]
  • Configuration4PVD-EX (CH-1F) process module w/ CTI Cryogenics PowerEco cryopump[1]
  • Process module CH-ACIS CH-A process module with Shimadzu TMP turbo pump[1]
  • Process module CH-BEtch/OXI-EX (CH-B) process module with Inficon Transpector XPR3 RGA, Shimadzu TMP-3203LM-N1 turbo pump[1]
  • Process module CH-E8PVD-EX (CH-E) process module with CTI Cryogenics PowerEco cryopump[1]
  • Process module CH-F5PVD-EX (CH-F) process module with Shimadzu TMP turbo pump[1]
  • Process module CH-1A8PVD-EX (CH-1A) process module with cryopump[1]
  • Process module CH-1D4/4PVD-1D process module with Anelva P-126CL turbopump[1]
  • Process module CH-1F4PVD-EX (CH-1F) process module with CTI Cryogenics PowerEco cryopump[1]

Where are the manuals?

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Not publicly documented

Field notes

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Not publicly documented

The following facts about the Anelva C 7100 PVD Cluster are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Anelva C 7100 PVD Cluster are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Anelva C 7100 PVD Cluster are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Anelva C 7100 PVD Cluster are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Anelva C 7100 PVD Cluster are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Anelva C 7100 PVD Cluster is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]Canon/Anelva C7100 PVD, SPUTTERING SYSTEMS | SemiStar — semistarcorp.comsemistarcorp.com
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Last updated Oct 5, 2026.

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