Lam Research Concept One

Models in this family

1. 

   Concept One

   The Lam / Novellus Concept One is a chemical vapor deposition (CVD) system used for depositing thin films on semiconductor wafers.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   6 inch version	—	—	Listed with 6-inch wafer size; one listing includes Nitride / TEOS and 3 Phase, 50/60 Hz, 208V Vac.	Equipment inventory listing[1]
   8 inch version	—	2012	Listed with 8-inch wafer size and 2012 vintage; one listing includes Nitride / TEOS and 208V, 50/60 Hz, 3 Phase.	Equipment inventory listing[2]

2. 

   Concept One TEOS

   The Concept One TEOS is a gas cabinet from Lam Research (formerly Novellus) for TEOS gas handling, featuring a flow box inside.

Sources