Waferpedia

Comparison ledger

160 XP IonversusEHP 500 Ion

Varian 160 XP Ion, Varian EHP 500 Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMVarianVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyVarian 160 XP IonVarian EHP 500 Ion
Specifications
Configuration150mm High Current IMP[1]SMIF[3]
OEMVarian[2]—
Model160 XP Ion[2]—
CategoryIon Implantation[1]—
Tool typeion implanter[1]—
Software version—13.42.18[3]
CIM—GEM and SECS[3]
Handler—End station PP+ with both Load Lock[3]
Wafer size—8 inch[3]
Handler / End station—End station PP+ with both Load Lock[3]
SMIF—Included[3]
Scrubber Exhaust—Included[3]
2 Stage Rough Pump—Included[3]
Load Lock Rough Pump—Included[3]
Vintage year—1998[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]Equipment inventory listing
  3. [3]inventory listing