Waferpedia

Comparison ledger

CP3000versus100R16

Logitech CP3000, Strasbaugh 100R16, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
CP3000Logitech
100R16Strasbaugh
OEMLogitechStrasbaugh
CategoryCMPCMP
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLogitech CP3000Strasbaugh 100R16
Specifications
Recommended useIdeal for use with a Logitech CP3000 Chemical Polishing Machine[1]—
Cabinet model1CP3AC-0100[1]—
ConstructionSteel protected with an anti-acid polyethylene coating[1]—
Transparent elementsAcrylic panels[1]—
Temperature range15°C to 32°C[1]—
HumidityMax RH 80% for temperatures up to 31°C[1]—
Filter typeOS 4 Pre-Filter 1; Organic Vapours Secondary acids Enviro Carbon Filter (OS); Acid Vapours Secondary Organic acids Enviro Carbon Filter (H+)[1]—
Volume of air130 m3/hr[1]—
Face velocity>0.5 m/s[1]—
Fan typeEBM R2E-190-AO26-05 230V 50Hz dynamically balanced centrifugal[1]—
Opening typeTeardrop[1]—
Power consumption45 Watts[1]—
Supply amps5.0[1]—
Voltage230V ± 10% 50 Hz[1]—
Airflow alarmAMS programmable electronic with audible as an option[1]—
LightingIntegrated lighting up to 19W, available as an option[1]—
Sound level< 50 dBA at 1 metre[1]—
Net weight75 kg[1]—
type—1 spindle grinder/polisher[2]
drive system—DC drive system with 2 motors[2]
spindle RPM—1-180 RPM[2]
eccentric RPM—1-90 RPM[2]
controls—digital timer; air down switch; spindle and eccentric speed dials; air regulators[2]
capacity—16 inches[2]
spindle size—1-8 TPI[2]
overall dimensions—28 inches x 36 inches x 48 inches[2]
weight—500 lbs[2]
origin—made in the USA[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]excelltechnology.comexcelltechnology.com