Waferpedia

Comparison ledger

120 ContinuousversusCP3000

Lapmaster 120 Continuous, Logitech CP3000, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
CP3000Logitech
OEMLapmasterLogitech
CategoryCMPCMP
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLapmaster 120 ContinuousLogitech CP3000
Specifications
Recommended use—Ideal for use with a Logitech CP3000 Chemical Polishing Machine[1]
Cabinet model—1CP3AC-0100[1]
Construction—Steel protected with an anti-acid polyethylene coating[1]
Transparent elements—Acrylic panels[1]
Temperature range—15°C to 32°C[1]
Humidity—Max RH 80% for temperatures up to 31°C[1]
Filter type—OS 4 Pre-Filter 1; Organic Vapours Secondary acids Enviro Carbon Filter (OS); Acid Vapours Secondary Organic acids Enviro Carbon Filter (H+)[1]
Volume of air—130 m3/hr[1]
Face velocity—>0.5 m/s[1]
Fan type—EBM R2E-190-AO26-05 230V 50Hz dynamically balanced centrifugal[1]
Opening type—Teardrop[1]
Power consumption—45 Watts[1]
Supply amps—5.0[1]
Voltage—230V ± 10% 50 Hz[1]
Airflow alarm—AMS programmable electronic with audible as an option[1]
Lighting—Integrated lighting up to 19W, available as an option[1]
Sound level—< 50 dBA at 1 metre[1]
Net weight—75 kg[1]

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Sources (1)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org