Waferpedia

Comparison ledger

17099370 Outer strike plateversusNV GSD 200 Ion

Axcelis 17099370 Outer strike plate, Axcelis NV GSD 200 Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMAxcelisAxcelis
CategoryIon ImplantationIon Implantation
Wafer size—150mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis 17099370 Outer strike plateAxcelis NV GSD 200
Specifications
ConfigurationUsed with Axcelis GSD 200[1]Features:[3]
ManufacturerAxcelis[2]—
Model17099370 Outer strike plate[1]—
Part numberOEM number 17099370[2]—
Used withAxcelis GSD 200[1]—
ConditionNEW[2]—
Phase—3 Phase[3]
Voltage—208V, 710A[3]
Gases—B/As/Ar[3]
Total energy—200 KEV[3]
Throughput—210 pieces/hour[3]
Wafer size—6 inch[3]
Power—3 Phase, 208V, 710A[3]
Process gases—B/As/Ar[3]
SDS gas lines—2 lines (ASH3 and PH3)[3]
HP gas lines—2 lines (BF3 and ARGON)[3]
Cassette—25 slots, 4 cassettes capacity[3]
Source head—ELS source head[3]
Control hardware—2 SUN Workstations, VME 177 cell controller[3]
Post acceleration high voltage—80 KEV[3]
Drive—Belt type rotary drive[3]
Implant angle—Variable, 2-axis[3]
Dose controller—Real-time patented dose controller[3]
Dose range—5E11~1E16 Ions/cm2[3]
Arm—Std Arm 150mm[3]
Wafer holder—Std 150mm[3]
Beam energy—5 KeV[3]
Beam current—50 mA[3]
Electron shower—P-Shower electron shower[3]
CE marking—CE marked[3]
Beam Current—50 mACE marked[3]

Plan your fab

Building a Ion Implantation process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]inventory listing