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0020 12458 PartversusSolution E-Beam

Applied Materials 0020 12458 Part, CHA Solution E-Beam, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 12458 PartApplied Materials
OEMApplied MaterialsCHA
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 12458 PartCHA Solution E-Beam
Specifications
ConfigurationInsulator,Side Match,Hdp-Cvd Ultima Plus[1]5 Wire[2]
Asset number146526[1]—
MakeApplied Materials[1]—
Model0020 12458[1]—
Voltage—220 VAC[2]
Phase—3 Phase[2]
Frequency—60 Hz[2]
Chamber type—Water cooled stainless steel chamber[3]
Electron beam gun—SmartSource electron beam gun with motor driven crucible rotation and lift lid[3]
Source pockets—4 x 25cc material source pockets[3]
Source distance—15 inches[3]
Chamber volume—4.5 cubic feet[3]
Control—PLC automation with touchscreen[3]
Operational modes—Manual or automatic[3]
Deposition controller—Maxtek rate and thickness deposition controller integrated for control of shutter and electron beam power supply[3]
Substrate holder—Dome for holding 2 inch and/or 3 inch back loaded substrates positioned 90 degrees to the source; Dome for two 6 x 6 inch square back loaded substrates positioned 90 degrees to the source[3]
Material source pockets—4 x 25cc[3]
Substrate sizes—2 inch, 3 inch, 6x6 inch square[3]
Electrical requirements—220 VAC, 3 Phase, 60 Hz, 5 Wire, 100 Amps[2]
Power supply—Glassman PS/LQ10N1.00GB4 (noted issue)[2]
Operation modes—Manual or automatic[3]
Available metals (list from UCLA)—Ti, Cr, Ni, NiFe, Al, Au, Ag, Pt, Cu, Nb, Gd, Co, Ge, Ag, Nb, Sn, W, Fe, TiN Ta, SiO2, NiO, TiO2, Al2O3, HfO2[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]smif.pratt.duke.edusmif.pratt.duke.edu
  4. [4]nanolab.ucla.edunanolab.ucla.edu