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0010-13622 RF Match forversusEagle XP

Applied Materials 0010-13622 RF Match for, ASM Eagle XP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-13622 RF Match forApplied Materials
OEMApplied MaterialsASM
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13622 RF Match forASM Eagle
Specifications
ConfigurationHigh Efficiency HE RF Match-Bias[1]XP Platform[2]
Model0010-13622[1]Eagle XP[3]
Product TypeRF Match for PVD (Physical Vapor Deposition)[1]—
FeatureHigh Efficiency HE RF Match-Bias[1]—
Robot Type—Yawuski[2]
Power Supply & AC Dist Box—P/N 1060-625-01[2]
Backing Pump(s)—ALD/LL/WHC is Edwards IXH 1210[2]
Heater Jacket—Intraco Taiwan Corporation[3]
CDA LLC PN2—403[2]
DIW—2.95[3]
Vacuum Load Port Vacuum—-86.2[2]
Gas LLC Pressure—0.56/0.209 MPA[2]
FI—100 Pa[3]
Ar—500 SCCM, 3 SLM[3]
N2—500 SCCM[3]
Differential—3.5 Pa[3]
Process—ALD (Atomic Layer Deposition)[3]
Wafer size—12 inch[3]
Gas delivery—Ar 500 SCCM, 3 SLM; N2 500 SCCM[2]
HDD—not included[3]
Cables—all cables present[3]
System software version—1.58a-001[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]inventory listing