SUSS MicroTec
ACS 200 + alternatives
Comparable Lithography equipment documented in the Waferpedia catalog.
6 comparable tools
Tokyo Electron
Lithius Pro
Lithography
Tokyo Electron Lithius Pro is a coater/developer described as an immersion COT and DEV system with rinse processing at pre-/post-exposure.
Heidelberg Instruments
MLA150
150mm
Lithography
The Heidelberg Instruments MLA150 is a mask-less direct-write lithography system for exposing photoresist on substrates without a photomask.
Brooks
017-0024-01 Prealigner
Lithography
Brooks
017-0146-01 Prealigner
Lithography
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
Ultratech
1000 Family
Lithography
EV Group
101
Lithography
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.
Compare interactively
Need a side-by-side spec table? Open the compare tool to pick any two models.
Compare ACS 200 + with another model →