Waferpedia

Comparison ledger

150 e MaskversusMA 12

SUSS MicroTec 150 e Mask, SUSS MicroTec MA 12, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
150 e MaskSUSS MicroTec
MA 12SUSS MicroTec
OEMSUSS MicroTecSUSS MicroTec
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySUSS MicroTec 150 e MaskSUSS MicroTec MA 12
Specifications
Automation—Semi-automated system[1]
Maximum wafer size—up to 300 mm[1]
Functions—Mask Alignment, Exposure[1]
Product category—Mask Aligner (Proximity Exposure)[1]

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Sources (1)Every fact above is drawn from these public sources
  1. [1]hilpert.chhilpert.ch