Oxford Instruments
Plasmalab 100 ICP 380 alternatives
Comparable Etch equipment documented in the Waferpedia catalog.
6 comparable tools
Applied Materials
Centura TPCC RTP XE+
Etch
The Applied Materials Centura TPCC RTP XE+ is an etcher designed for 8-inch wafers.
SPTS
CPX Pegasus
Etch
The SPTS / STS CPX Pegasus is an etcher with 8-inch wafer support and a two-chamber configuration.
Applied Materials
P 5000 MxP+
Etch
Applied Materials P 5000 MxP+ is an etcher with source-listed wafer sizes of 6-inch and 8-inch.
Lam Research
TCP 9600 SE Metal
Etch
The Lam TCP 9600 SE Metal Etch is a plasma etch system for metal layers on 6-inch and 8-inch wafers.
Applied Materials
0010 47763
Etch
The Applied Materials 0010-47763 is an electrostatic chuck (ESC) assembly used in semiconductor etching processes.
Applied Materials
0010-16392 ESC Assembly
Etch
The Applied Materials 0010-16392 is an electrostatic chuck assembly designed for 300 mm wafer processing, featuring a dual electrode configuration.
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