Waferpedia

Comparison ledger

100 ICP FluorineversusWS 820 L

Oxford Instruments 100 ICP Fluorine, SCREEN WS 820 L, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
100 ICP FluorineOxford Instruments
WS 820 LSCREEN
OEMOxford InstrumentsSCREEN
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—1996 Vintage · 1997 Vintage
Control system——
Generation——
FamilyOxford Instruments 100 ICP FluorineSCREEN WS 820 L
Specifications
Etch GasesSF6, CF4, O2, Ar, N2, CHF3, C4F8[1]—
Cryo DRIE etch rateup to 5 µm/min[1]—
Wafer size4 inch, 6 inch, 8 inch (with clamp change)[1]—
Configuration—SiN Wet Etching[2]
Chemical—H3PO4 , IPA , HF[2]
PLC (Loader / Unloader)—Mitsubishi A3A CPU P21[2]
Olifra—wafer flatzone[2]
Main PC—Mitsubishi/LM (hard disket OK)[2]
Signal Tower—3 color (GYR) Patlite lamp type[2]
Phase—3 Phase, 208V, 170a, 100V[2]
Left/ Right Stepping Motor (Oriental—VEXTA A 6259)[2]
Up/Down Stepping Motor (Oriental—VEXTA PK 596 H[2]
Wafer Size—8 inch[2]
Process—SiN wet etching, nitride strip[2]
Chemicals—H3PO4, IPA, HF[2]
Transfer Type—Rear type transfer flow[2]
IPA Dryer Fire Extinguisher—Yes[2]
PLC—Mitsubishi A3A CPU P21[2]
Wafer Flatzone—Olifra[2]
Front Carrier Detector Sensor—Yes[2]
Power—3 Phase, 208V, 170A, 100V[2]
Carrier Loading—2 carrier loading (stocker 8 carrier loading)[2]
Stepping Motors (Left/Right)—Oriental VEXTA A 6259[2]
Stepping Motors (Up/Down)—Oriental VEXTA PK 596 H[2]
Measuring Units—H3PO4 measuring tank, DIW measuring tank, H3PO4 DIW spiking pump, HF measuring tank[2]
Resistivity Meter—DKK AQ 10 (Final Rinse)[2]
Circulation Heater—In-Line Heater[2]
Circulation Pump—FS 30 HT 2[2]
Circulation Filter—High Temp Filter[2]
Aspirator Drain—Yes[2]
Pump—FS 30 HT 2[2]
Filter—High Temp Filter[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]nanofab.utah.edunanofab.utah.edu
  2. [2]inventory listing