Lam Research
AutoEtch 490 plasma etcher plasma etch semiconductor alternatives
Comparable Etch equipment documented in the Waferpedia catalog.
6 comparable tools
Lam Research
AutoEtch 590 plasma etcher plasma etch semiconductor
6"
Etch
The Lam AutoEtch 590 is an in-line cassette to cassette, fully automated, single wafer, double air-locked, parallel plate plasma etching system.
SCREEN
SU 2000
6"
Etch
The SCREEN / DNS SU 2000 is a single-wafer wet etch tool available in both acid and solvent configurations, supporting 6-inch and 8-inch wafers.
Applied Materials
0010 47763
Etch
The Applied Materials 0010-47763 is an electrostatic chuck (ESC) assembly used in semiconductor etching processes.
Applied Materials
0010-16392 ESC Assembly
Etch
The Applied Materials 0010-16392 is an electrostatic chuck assembly designed for 300 mm wafer processing, featuring a dual electrode configuration.
Applied Materials
0041-39086 ESC Part
Etch
Oxford Instruments
100 ICP Fluorine
Etch
Oxford Instruments 100 ICP Fluorine is an inductively coupled plasma etcher for fluorine-based etching, supporting cryo DRIE and multiple etch gases including SF6 and C4F8.
Compare interactively
Need a side-by-side spec table? Open the compare tool to pick any two models.
Compare AutoEtch 490 plasma etcher plasma etch semiconductor with another model →