Comparison ledger
KLA .496 PSL Wafer, KLA Surfscan 6400 Particle Defect, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ||
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .496 PSL Wafer | KLA Surfscan 6400 |
| Specifications | ||
| Configuration | NIST Traceable[1] | Greater than 0.20um[4] |
| Wafer size | 8 inch[1] | 6 inch[4] |
| Traceability | NIST Traceable[1] | — |
| Compatible systems | Capable on Surfscan 6xy0 and SP1[1] | — |
| Category | Metrology & Inspection[2] | Metrology & Inspection[3] |
| Phase | — | 1 Phase[3] |
| Voltage | — | 208V, 17A, 60Hz[4] |
| Manufacturer | — | KLA[4] |
| Model | — | Surfscan 6400 Particle Defect[4] |
| Power | — | 208V, 17A, 60Hz[3] |
| Defect sensitivity | — | Greater than 0.20um[4] |
| Defect sensitivity at 95% capture rate | — | Greater than 0.10um[4] |
| Count repeatability error | — | Less than 1.5%[4] |
| Count reference | — | Greater than 500, 0.364um diameter latex spheres on bare silicon[4] |
| Dynamic range | — | 0.1um to 100um in a single measurement[4] |
| Throughput | — | Up to 120 wafers per hour (150mm), 95 wafers per hour (200mm)[4] |
| Contamination | — | Less than 0.005 particles/cm2 greater than 0.15um diameter per single pass in a class 10 cleanroom[4] |
| Handling | — | Single puck handling from cassette or platform[4] |
| Illumination source | — | 30mW Argon-Ion laser, 488nm wavelength[4] |
| Material | — | Any surface that scatters less than 90% of incident light[5] |
| Relative standard spatial resolution | — | 50 um spacing, minimum[5] |
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