Applied Materials
Producer S alternatives
Comparable Deposition equipment documented in the Waferpedia catalog.
6 comparable tools
Lam Research
Concept One 150
Deposition
The Lam / Novellus Concept One 150 is a plasma-enhanced chemical vapor deposition (PECVD) system for 6-inch wafers.
Lam Research
Concept Two Sequel
Deposition
The Lam / Novellus Concept Two Sequel is a PECVD (plasma-enhanced chemical vapor deposition) system for 8-inch wafers.
Applied Materials
0010-13622 RF Match for
Deposition
The Applied Materials 0010-13622 is an RF match unit intended for PVD (Physical Vapor Deposition) described as a High Efficiency HE RF Match-Bias.
Applied Materials
0020 12458 Part
Deposition
The Applied Materials 0020 12458 Part is an insulator, side match component for the Hdp-Cvd Ultima Plus system.
Applied Materials
0020 17485 Part
Deposition
Applied Materials
0020 18455 Part
Deposition
Applied Materials 0020 18455 is a part described as "Shaft, Rf In Local Match, Hdpcvd, Rev3."
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